For the case of broad spectrum and high resolution spectral measurement under limited number of pixels and the pixel size of the photodiode array, we propose a recording oblique interferogram scheme based on the two-dimensional (2D) shear interference, which is used to stitch those pixels on different rows of the focal plane array to improve the resolution in the long-wave and avoid the cut-off in the short-wave caused by increase in unit shear. We use the Wollaston prism polarization interferometer to verify the 2D-directional shear interference by rotating the image plane, and calculate the carrier frequency relation of the lateral shear volume in the coordinates of CCD. The complete interferogram is composed of several columns by connecting the margin pixels of equal-phase. Using the FRED software to simulate the polarization interference process, we calculate 1064 nm, 1550 nm, and 1970 nm laser lines from quasi-monochromatic when using calcite crystal and C-RED ONE detector. The results show that when the slope of the rotation angle is 1/3, the position precision of retrieved spectral lines by 2D-shear interference is less than 1 nm, and the amplitude ratio is 0.9958∶0.9759∶1. The spectral resolution at 1970 nm increases to 13 nm, which is 2.38 times of the original value. The near-infrared reflectance spectra of the wax are compared with two kinds of recovery. The spectra inversion of the extended optical path difference including 768 pixels shows more absorption characteristics, showing a higher spectral resolvability compared to the inversion by optical path difference of 320 pixels, though some high-frequency disturbance is introduced in the short-wave direction. The relationship between the angle error tolerance and the rotating angle, the observed wavelength, the shear angle and the segmented optical path difference is given when imaging magnification is constant. Based on the 2D shear interference spectrometer by rotating the photodiode array, the contradiction between the high spectral resolution and the high-frequency cut-off caused by simply increasing the amount of shear is avoided, which expands the solution range of system parameters and related error tolerance, providing a choice for wide range and high-spectral measurement.