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    Journals >Acta Optica Sinica >Volume 37 >Issue 2 >Page 231001 > Article
    • Acta Optica Sinica
    • Vol. 37, Issue 2, 231001 (2017)
    Energy Band Properties of Hafnium Oxide Thin Films Fabricated by Ion Beam Sputtering Technique
    Liu Huasong1、2、*, Wang Lishuan1、2, Yang Xiao1, Liu Dandan1, Jiang Chenghui1, Jiang Yugang1, Ji Yiqin1、2, Zhang Feng1, and Chen Deying2
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  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/aos201737.0231001 Cite this Article Set citation alerts
    Liu Huasong, Wang Lishuan, Yang Xiao, Liu Dandan, Jiang Chenghui, Jiang Yugang, Ji Yiqin, Zhang Feng, Chen Deying. Energy Band Properties of Hafnium Oxide Thin Films Fabricated by Ion Beam Sputtering Technique[J]. Acta Optica Sinica, 2017, 37(2): 231001 Copy Citation Text show less
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    Liu Huasong, Wang Lishuan, Yang Xiao, Liu Dandan, Jiang Chenghui, Jiang Yugang, Ji Yiqin, Zhang Feng, Chen Deying. Energy Band Properties of Hafnium Oxide Thin Films Fabricated by Ion Beam Sputtering Technique[J]. Acta Optica Sinica, 2017, 37(2): 231001
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