• Acta Optica Sinica
  • Vol. 37, Issue 10, 1031001 (2017)
Huasong Liu1、2、3, Xiao Yang1, Dandan Liu1, Chenghui Jiang1, Shida Li1, Yiqin Ji1、2、3、*, Feng Zhang1, Lishuan Wang1、2, Yugang Jiang1, and Deying Chen2
Author Affiliations
  • 1 Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Institute of Technical Physics, Aerodynamic Technology Academy of China Aerospace Science and Industry Corp., Tianjin 300308, China
  • 2 National Key Laboratory of Science and Technology on Tunable Laser, Institute of Opto-Electronics, Harbin Institute of Technology, Harbin, Heilongjiang 150080, China
  • 3 Shenzhen Aerospace Industry Technology Research Institute, China Aerospace Science and Industry Corp., Shenzhen, Guangdong 518048, China
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    DOI: 10.3788/AOS201737.1031001 Cite this Article Set citation alerts
    Huasong Liu, Xiao Yang, Dandan Liu, Chenghui Jiang, Shida Li, Yiqin Ji, Feng Zhang, Lishuan Wang, Yugang Jiang, Deying Chen. Spot Effect in Optical Constant Characterization of Thin Films Fabricated by Ion Beam Sputtering[J]. Acta Optica Sinica, 2017, 37(10): 1031001 Copy Citation Text show less
    Major axis length of spot on sample surface versus incident angle
    Fig. 1. Major axis length of spot on sample surface versus incident angle
    Area of spot on sample surface versus incident angle
    Fig. 2. Area of spot on sample surface versus incident angle
    Measured results of elliptical polarization paremeters of Ta2O5 films. (a) ψ(λ,θ); (b) Δ(λ,θ)
    Fig. 3. Measured results of elliptical polarization paremeters of Ta2O5 films. (a) ψ(λ,θ); (b) Δ(λ,θ)
    Measured results of elliptical polarization paremeters of HfO2 films. (a) ψ(λ,θ); (b) Δ(λ,θ)
    Fig. 4. Measured results of elliptical polarization paremeters of HfO2 films. (a) ψ(λ,θ); (b) Δ(λ,θ)
    (a) Constant term of refractive index, (b) film layer thickness, and (c) surface layer thickness of Ta2O5 films versus major axis length of elliptic spot
    Fig. 5. (a) Constant term of refractive index, (b) film layer thickness, and (c) surface layer thickness of Ta2O5 films versus major axis length of elliptic spot
    (a) Constant term of refractive index, (b) film layer thickness, and (c) surface layer thickness of HfO2 films versus major axis length of elliptic spot
    Fig. 6. (a) Constant term of refractive index, (b) film layer thickness, and (c) surface layer thickness of HfO2 films versus major axis length of elliptic spot
    Profilogram of HfO2 film surface
    Fig. 7. Profilogram of HfO2 film surface
    Profilogram of Ta2O5 film surface
    Fig. 8. Profilogram of Ta2O5 film surface
    Measured and fitting results of reflectivity of Ta2O5 films by reflectance spectroscopy method
    Fig. 9. Measured and fitting results of reflectivity of Ta2O5 films by reflectance spectroscopy method
    Measured and fitting results of reflectivity of HfO2 films by reflectance spectroscopy method
    Fig. 10. Measured and fitting results of reflectivity of HfO2 films by reflectance spectroscopy method
    Schematic of spot change in spectroscopic ellipsometry measurement
    Fig. 11. Schematic of spot change in spectroscopic ellipsometry measurement
    Huasong Liu, Xiao Yang, Dandan Liu, Chenghui Jiang, Shida Li, Yiqin Ji, Feng Zhang, Lishuan Wang, Yugang Jiang, Deying Chen. Spot Effect in Optical Constant Characterization of Thin Films Fabricated by Ion Beam Sputtering[J]. Acta Optica Sinica, 2017, 37(10): 1031001
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