• Acta Optica Sinica
  • Vol. 37, Issue 10, 1031001 (2017)
Huasong Liu1、2、3, Xiao Yang1, Dandan Liu1, Chenghui Jiang1, Shida Li1, Yiqin Ji1、2、3、*, Feng Zhang1, Lishuan Wang1、2, Yugang Jiang1, and Deying Chen2
Author Affiliations
  • 1 Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Institute of Technical Physics, Aerodynamic Technology Academy of China Aerospace Science and Industry Corp., Tianjin 300308, China
  • 2 National Key Laboratory of Science and Technology on Tunable Laser, Institute of Opto-Electronics, Harbin Institute of Technology, Harbin, Heilongjiang 150080, China
  • 3 Shenzhen Aerospace Industry Technology Research Institute, China Aerospace Science and Industry Corp., Shenzhen, Guangdong 518048, China
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    DOI: 10.3788/AOS201737.1031001 Cite this Article Set citation alerts
    Huasong Liu, Xiao Yang, Dandan Liu, Chenghui Jiang, Shida Li, Yiqin Ji, Feng Zhang, Lishuan Wang, Yugang Jiang, Deying Chen. Spot Effect in Optical Constant Characterization of Thin Films Fabricated by Ion Beam Sputtering[J]. Acta Optica Sinica, 2017, 37(10): 1031001 Copy Citation Text show less

    Abstract

    Optical films are prepared by using ion beam sputtering deposition. Basing on the spectroscopic ellipsometry measurement technique, the relationship between refractive index, film layer thickness, surface layer thickness and spot size is studied. The study results show that, with the increase of tested spot size on the sample surface, the refractive index of thin films decreases, while the film layer thickness and surface layer thickness increase. The spot effects of optical constants are verified by using the reflectance spectrophotometry and the profilometer, respectively. The study results show that the refractive index and the film layer thickness have weak transverse inhomogeneity, which can be weakened by the usage of large-size tested spots.
    Huasong Liu, Xiao Yang, Dandan Liu, Chenghui Jiang, Shida Li, Yiqin Ji, Feng Zhang, Lishuan Wang, Yugang Jiang, Deying Chen. Spot Effect in Optical Constant Characterization of Thin Films Fabricated by Ion Beam Sputtering[J]. Acta Optica Sinica, 2017, 37(10): 1031001
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