• Laser & Optoelectronics Progress
  • Vol. 54, Issue 6, 60501 (2017)
Yang Liangliang*, Liu Chenglin, Zhang Zhihai, and Tang Jian
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/lop54.060501 Cite this Article Set citation alerts
    Yang Liangliang, Liu Chenglin, Zhang Zhihai, Tang Jian. Optimal Design of Depth-Scaling Error with Oblique Incidence[J]. Laser & Optoelectronics Progress, 2017, 54(6): 60501 Copy Citation Text show less

    Abstract

    Based on the expression between diffraction efficiency and incident angle and the expression between diffraction efficiency and micro-structure height error under normal incidence, the mathematical relationship between micro-structure height error and diffraction efficiency or polychromatic integral diffraction efficiency (PIDE) for diffractive optical elements (DOEs) under oblique incidence is established. When the absolute value of the relative micro-structure height errors is equal, the corresponding diffraction efficiency and PIDE with negative micro-structure height errors are higher than those with positive micro-structure height errors. The analysis method and conclusion provide a theoretical reference for the determination of the machining tolerance of micro-structure height error for DOEs.
    Yang Liangliang, Liu Chenglin, Zhang Zhihai, Tang Jian. Optimal Design of Depth-Scaling Error with Oblique Incidence[J]. Laser & Optoelectronics Progress, 2017, 54(6): 60501
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