• Infrared and Laser Engineering
  • Vol. 51, Issue 6, 20210980 (2022)
Lei Pang1、2、3, Yang Cheng2、3, Wu Zhao2、3, Shaoyang Tan2、3, Yintao Guo2、3, Bo Li2、3, Jun Wang1、2、3, and Dayong Zhou3
Author Affiliations
  • 1College of Electronics and Information Engineering, Sichuan University, Chengdu 610065, China
  • 2Suzhou Everbright Photonics Co., Ltd., Suzhou 215163, China
  • 3Gusu Laboratory of Materials, Suzhou 215123, China
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    DOI: 10.3788/IRLA20210980 Cite this Article
    Lei Pang, Yang Cheng, Wu Zhao, Shaoyang Tan, Yintao Guo, Bo Li, Jun Wang, Dayong Zhou. Mid-infrared quantum cascade laser grown by MOCVD at 4.6 µm[J]. Infrared and Laser Engineering, 2022, 51(6): 20210980 Copy Citation Text show less

    Abstract

    Mid-infrared quantum cascade laser has various application prospects in infrared countermeasures, trace gas detection, free space optical communication and other fields. The method of using MOCVD to grow quantum cascade lasers has the advantages of high production efficiency, convenience for regrowth and multi-components growth. This paper reported a mid-infrared quantum cascade laser capable of continuous-wave operation at room temperature, with a wavelength of 4.6 μm, using MOCVD to grow strain-compensated InGaAs/InAlAs materials. The experiment explored the impact of different doping on chip performance, and determined that the device performance can be improved by optimizing the doping concentration. The maximum peak power of the chip with a cavity length of 3 mm and a ridge width of 13 μm in pulse mode was 722 mW at a temperature of 288K, the wall-plug efficiency and threshold current density were 6.3% and 1.04 kA/cm2, respectively, and the power output reached 364 mW in continuous-wave operation. This article has successfully realized the growth of mid-infrared quantum cascade laser by MOCVD, which provides technical support for laser applications in the mid-infrared band.
    Lei Pang, Yang Cheng, Wu Zhao, Shaoyang Tan, Yintao Guo, Bo Li, Jun Wang, Dayong Zhou. Mid-infrared quantum cascade laser grown by MOCVD at 4.6 µm[J]. Infrared and Laser Engineering, 2022, 51(6): 20210980
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