Analysis of Mid-Spatial Frequency Surface Errors Effects on Local Flare in Lithographic Projection Lens

Yang Wang; Huang Wei; Xu Weicai; Shang Hongbo

doi:10.3788/aos201333.0922001

[1] J P Kirk. Scattered light in photolithographic lenses [C]. SPIE, 1994, 2197: 566-572.

[2] C Krautschik, M Chandhok, G Zhang, et al.. Implementing flare compensation for EUV masks through localized mask CD resizing [C]. SPIE, 2003, 5037: 58-68.

[3] Stephen P Renwick, Steven D Slonaker, Taro Ogata. Size-dependent flare and its effect on imaging [C]. SPIE, 2003, 5040: 24-32.

[4] J R Harvey, A Kotha. Scattering effects from residual optical fabrication errors [C]. SPIE, 1995, 2576: 155-174.

[5] Yuan Yukai. Stray light suppressing measure of optical system [J]. Journal of Atmospheric and Enviromental Optics, 2007, 2(1): 6-10.

[6] Xu Deyan, Shen Weixing, Lin Zunqi. Response of optic profiler to spatial wavelength of optical element surface [J]. Acta Optica Sinica, 1998, 18(12): 1721-1726.

[7] Niu Jinxing, Zhou Renkui, Liu Zhaohui, et al.. Analysis and calculation of space-based infrared detecting system [J]. Acta Optica Sinica, 2010, 30(3): 768-771.

[8] Chen Xue, Sun Chuang, Xia Xinlin. Stray light suppression property of baffle with honeycombed wall [J]. Acta Optica Sinica, 2012,32(5): 0523004.

[9] Richard N Youngworth, Bryan D Stone. Simple estimates for the effects of mid-spatial-frequency surface errors on image quality [J]. Appl Opt, 2000, 39(13): 2198-2209.

[10] Bryan D Stone, Thomas J Bruegge. Practical considerations for simulating beam propagation: a comparison of three approaches [C]. International Optical Design Conferece, 2002. International Society for Optics and Photonics, 2002: 359-378.

[11] Michael Bass, Casimer De Cusatis, Jay Ewoch, et al.. Handbook of Optic, Volume I: Geometrical and Physical Optics, Polarized Light, Components and Instruments [M]. McGraw-Hill, Inc, 1995. 7.1-7.12.

[12] J M Elson, J M Bennett. Calculation of the power spectral density from surface profile data [J]. Appl Opt, 1995, 34(1): 201-208.

[13] International standard, ISO10110-8: Surface Texture [S]. 1997.

[14] Y Omura. Projection Exposure Method and Apparatus and Projection Optical System. European Patent: 1139138 [P]. 2001-10-04.

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