• Laser & Optoelectronics Progress
  • Vol. 48, Issue 8, 81203 (2011)
Yan Shunhua1、2、*, Ren Weiyan1, Sun Yanhong1, Jing Chunyuan1, and Hua Weihong2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/lop48.081203 Cite this Article Set citation alerts
    Yan Shunhua, Ren Weiyan, Sun Yanhong, Jing Chunyuan, Hua Weihong. Toxic Ingredients Measurement in Exhaust Gas of DF Chemical Laser[J]. Laser & Optoelectronics Progress, 2011, 48(8): 81203 Copy Citation Text show less
    References

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    [2] Sang Fengting, Zhou Dazheng, Jing Yuqi. Chemical Laser[M]. Beijing: Chemical Industry Press, 2000

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    [4] L. E. Wilson. Deuteniun fluouide CW chemical laser[C]. AIAA, 1994: 94-76344

    [5] R. W. F. Grouse, J. F. Brantec. Chemical Laser Manual[M]. Yin Houming Transl.. Beijing: Science Press, 1987

    [6] J. O. Hirschfelder, C. F. Curtiss, R. B. Bind. Molecular Theory of Gases and Liquids[M]. New York: Wiley & Sons, 1954

    [7] Robert E. Waldo. Advanced CW hydrogen fluoride chemical laser performance[C]. SPIE, 1993, 1871: 252~264

    [8] The State Environmental Protection Agency. HJ2.2-2008 Atmospheric environmental impact assessment technical guideline[S]. Beijing: China Environmental Science Press, 2008

    [9] Hao Jiming, Ma Guangda. Air Pollution Control Engineering[M]. Beijing: Higher Education Press,1999

    [10] The State Environmental Protection Agency. HJ481-2009 Environment Air, Measurement the Concentration of Fluoride[S]. Beijing: China Environmental Science Press, 2009

    Yan Shunhua, Ren Weiyan, Sun Yanhong, Jing Chunyuan, Hua Weihong. Toxic Ingredients Measurement in Exhaust Gas of DF Chemical Laser[J]. Laser & Optoelectronics Progress, 2011, 48(8): 81203
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