• Laser & Optoelectronics Progress
  • Vol. 48, Issue 8, 81203 (2011)
Yan Shunhua1、2、*, Ren Weiyan1, Sun Yanhong1, Jing Chunyuan1, and Hua Weihong2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    DOI: 10.3788/lop48.081203 Cite this Article Set citation alerts
    Yan Shunhua, Ren Weiyan, Sun Yanhong, Jing Chunyuan, Hua Weihong. Toxic Ingredients Measurement in Exhaust Gas of DF Chemical Laser[J]. Laser & Optoelectronics Progress, 2011, 48(8): 81203 Copy Citation Text show less

    Abstract

    The toxic components concentration of the exhaust gas of DF chemical laser in the working environment is analyzed. By applying the Gaussian normal equation of gas diffusion, a gas diffusion model is established under the experimental conditions to calculate the wind speed under different gas concentrations. Based on temporal and spatial distribution of the concentration of pollutants, the sampling points are selected, and the atmospheric sampling of trace fluoride method is developed. The gas under different conditions in different regions are measured. Then the experimental data are analyzed and compared with the national standard. The results show that, after the exhaust gas of DF chemical laser is expelled into the atmosphere, toxic ingredients in their working environment have some residue, but the concentration is in the security permitted range.
    Yan Shunhua, Ren Weiyan, Sun Yanhong, Jing Chunyuan, Hua Weihong. Toxic Ingredients Measurement in Exhaust Gas of DF Chemical Laser[J]. Laser & Optoelectronics Progress, 2011, 48(8): 81203
    Download Citation