Narrow vertical beam divergence angle for display applications of 645 nm lasers

Yufei Jia; Yufei Wang; Xuyan Zhou; Linhai Xu; Pijie Ma; Jingxuan Chen; Hongwei Qu; Wanhua Zheng

doi:10.3788/COL202119.101401

Journals >Chinese Optics Letters >Volume 19 >Issue 10 >Page 101401 > Article

Chinese Optics Letters
Vol. 19, Issue 10, 101401 (2021)

Narrow vertical beam divergence angle for display applications of 645 nm lasers

Yufei Jia^1、2, Yufei Wang^1、3, Xuyan Zhou¹, Linhai Xu^1、2, Pijie Ma^1、3, Jingxuan Chen^1、2, Hongwei Qu¹, and Wanhua Zheng^{1、2、3、4、*}

Author Affiliations

¹Laboratory of Solid State Optoelectronics Information Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³College of Future Technology, University of Chinese Academy of Sciences, Beijing 101408, China

⁴State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

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DOI: 10.3788/COL202119.101401 Cite this Article Set citation alerts

Yufei Jia, Yufei Wang, Xuyan Zhou, Linhai Xu, Pijie Ma, Jingxuan Chen, Hongwei Qu, Wanhua Zheng. Narrow vertical beam divergence angle for display applications of 645 nm lasers[J]. Chinese Optics Letters, 2021, 19(10): 101401 Copy Citation Text

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