Review on the Progress of Parallel Micro/Nano Lithography Based on Spatial Light Modulator

Junjie Kuang; Ningning Luo; Jingya Zhang; Yanlei Wang; Xin Xiong; Qingwang Meng

doi:10.3788/LOP202259.1100009

Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 11 >Page 1100009 > Article

Laser & Optoelectronics Progress
Vol. 59, Issue 11, 1100009 (2022)

Review on the Progress of Parallel Micro/Nano Lithography Based on Spatial Light Modulator

Junjie Kuang^1、2, Ningning Luo^1、2、*, Jingya Zhang^1、2, Yanlei Wang^1、2, Xin Xiong^1、2, and Qingwang Meng^1、2

Author Affiliations

¹Key Laboratory of Opto-Electronic Information Science and Technology of Jiangxi Province, Nanchang Hangkong University, Nanchang 330063, Jiangxi , China

²Jiangxi Engineering Laboratory for Opto-Electronic Measuring Technology, Nanchang Hangkong University, Nanchang 330063, Jiangxi , China

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DOI: 10.3788/LOP202259.1100009 Cite this Article Set citation alerts

Junjie Kuang, Ningning Luo, Jingya Zhang, Yanlei Wang, Xin Xiong, Qingwang Meng. Review on the Progress of Parallel Micro/Nano Lithography Based on Spatial Light Modulator[J]. Laser & Optoelectronics Progress, 2022, 59(11): 1100009 Copy Citation Text

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