Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography

Yonghui Zhang; Zihui Zhang; Chong Geng; Shu Xu; Tongbo Wei; Wen'gang Bi

doi:10.3788/COL201715.062201

Journals >Chinese Optics Letters >Volume 15 >Issue 6 >Page 062201 > Article

Chinese Optics Letters
Vol. 15, Issue 6, 062201 (2017)

Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography

Yonghui Zhang^1,2, Zihui Zhang^1,2, Chong Geng^1,2, Shu Xu^1,2..., Tongbo Wei^3,* and Wen'gang Bi^1,2|Show fewer author(s)

Author Affiliations

¹Institute of Micro-Nano Photoelectron and Electromagnetic Technology Innovation, School of Electronics and Information Engineering, Hebei University of Technology, Tianjin 300401, China

²Key Laboratory of Electronic Materials and Devices of Tianjin, Tianjin 300401, China

³Semiconductor Lighting Technology Research and Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

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DOI: 10.3788/COL201715.062201 Cite this Article Set citation alerts

Yonghui Zhang, Zihui Zhang, Chong Geng, Shu Xu, Tongbo Wei, Wen'gang Bi, "Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography," Chin. Opt. Lett. 15, 062201 (2017) Copy Citation Text

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