Zhifan Liu, Yanmin Cai, Yang Bu, Jianhua Zhang, Xiangzhao Wang. Stress Birefringence Analysis in Fused Silica at Deep Ultraviolet Waveband Based on Finite Element Simulation Method[J]. Acta Optica Sinica, 2021, 41(12): 1226001
- Acta Optica Sinica
- Vol. 41, Issue 12, 1226001 (2021)
Fig. 1. Schematic of three coordinate systems. (a) System coordinate; (b) refraction coordinate; (c) stress coordinate
Fig. 2. Stress components coloring contours. (a) Normal stress σx; (b) normal stress σy; (c) shear stress τxy
Fig. 3. Stress birefringence simulation results at 632.8 nm wavelength
Fig. 4. Wavefront map of exit pupil at 632.8 nm wavelength
Fig. 5. Measuring results of stress birefringence at 632.8 nm wavelength
Fig. 6. Simulation result of stress birefringence at 248 nm wavelength
Fig. 7. Simulation result of stress birefringence at 193 nm wavelength
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Table 1. Runtime analysis results of the two stress birefringence analysis methodsunit: s
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