• Acta Optica Sinica
  • Vol. 41, Issue 12, 1226001 (2021)
Zhifan Liu1, Yanmin Cai2, Yang Bu2、*, Jianhua Zhang1, and Xiangzhao Wang2
Author Affiliations
  • 1School of Mechatronic Engineering and Automation, Shanghai University, Shanghai 200444, China
  • 2Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
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    DOI: 10.3788/AOS202141.1226001 Cite this Article Set citation alerts
    Zhifan Liu, Yanmin Cai, Yang Bu, Jianhua Zhang, Xiangzhao Wang. Stress Birefringence Analysis in Fused Silica at Deep Ultraviolet Waveband Based on Finite Element Simulation Method[J]. Acta Optica Sinica, 2021, 41(12): 1226001 Copy Citation Text show less
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    The article is cited by 4 article(s) from Researching.
    Zhifan Liu, Yanmin Cai, Yang Bu, Jianhua Zhang, Xiangzhao Wang. Stress Birefringence Analysis in Fused Silica at Deep Ultraviolet Waveband Based on Finite Element Simulation Method[J]. Acta Optica Sinica, 2021, 41(12): 1226001
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