• Journal of Advanced Dielectrics
  • Vol. 11, Issue 1, 2150004 (2021)
N. Lyapunov1, C. H. Suen1, C. M. Wong1, Xiaodan Tang2, Z. L. Ho1, K. Zhou2, X. X. Chen1, H. M. Liu1, Xiaoyuan Zhou2、*, and J. Y. Dai1、**
Author Affiliations
  • 1Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong, P. R. China
  • 2College of Physics, Chongqing University, Chongqing 401331, P. R. China
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    DOI: 10.1142/S2010135X21500041 Cite this Article
    N. Lyapunov, C. H. Suen, C. M. Wong, Xiaodan Tang, Z. L. Ho, K. Zhou, X. X. Chen, H. M. Liu, Xiaoyuan Zhou, J. Y. Dai. Ultralow switching voltage and power consumption of GeS2 thin film resistive switching memory[J]. Journal of Advanced Dielectrics, 2021, 11(1): 2150004 Copy Citation Text show less

    Abstract

    The coming Big Data Era requires progress in storage and computing technologies. As an emerging memory technology, Resistive RAM (RRAM) has shown its potential in the next generation high-density storage and neuromorphic computing applications, which extremely demand low switching voltage and power consumption. In this work, a 10 nm-thick amorphous GeS2 thin film was utilized as the functional layer of RRAM in a combination with Ag and Pt electrodes. The structure and memory performance of the GeS2-based RRAM device was characterized — it presents high on/off ratio, fast switching time, ultralow switching voltage (0.15 V) and power consumption (1.0 pJ and 0.56 pJ for PROGRAM and ERASE operations, respectively). We attribute these competitive memory characteristics to Ag doping phenomena and subsequent formation of Ag nano-islands in the functional layer that occurs due to diffusion of Ag from electrode into the GeS2 thin film. These properties enable applications of GeS2 for low energy RRAM device.The coming Big Data Era requires progress in storage and computing technologies. As an emerging memory technology, Resistive RAM (RRAM) has shown its potential in the next generation high-density storage and neuromorphic computing applications, which extremely demand low switching voltage and power consumption. In this work, a 10 nm-thick amorphous GeS2 thin film was utilized as the functional layer of RRAM in a combination with Ag and Pt electrodes. The structure and memory performance of the GeS2-based RRAM device was characterized — it presents high on/off ratio, fast switching time, ultralow switching voltage (0.15 V) and power consumption (1.0 pJ and 0.56 pJ for PROGRAM and ERASE operations, respectively). We attribute these competitive memory characteristics to Ag doping phenomena and subsequent formation of Ag nano-islands in the functional layer that occurs due to diffusion of Ag from electrode into the GeS2 thin film. These properties enable applications of GeS2 for low energy RRAM device.
    N. Lyapunov, C. H. Suen, C. M. Wong, Xiaodan Tang, Z. L. Ho, K. Zhou, X. X. Chen, H. M. Liu, Xiaoyuan Zhou, J. Y. Dai. Ultralow switching voltage and power consumption of GeS2 thin film resistive switching memory[J]. Journal of Advanced Dielectrics, 2021, 11(1): 2150004
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