• Laser & Optoelectronics Progress
  • Vol. 57, Issue 19, 193102 (2020)
Zenglin Li and Ran Zuo*
Author Affiliations
  • School of Energy and Power Engineering, Jiangsu University, Zhenjiang, Jiangsu 212013, China
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    DOI: 10.3788/LOP57.193102 Cite this Article Set citation alerts
    Zenglin Li, Ran Zuo. Simulation of Interfacial Stress in Sapphire-GaN Heterogeneous Film System[J]. Laser & Optoelectronics Progress, 2020, 57(19): 193102 Copy Citation Text show less
    Schematic of thin film system. (a) Sapphire-GaN heterogeneous film system; (b) force free body in specified interface
    Fig. 1. Schematic of thin film system. (a) Sapphire-GaN heterogeneous film system; (b) force free body in specified interface
    Finite element model of sapphire-GaN heterogeneous film system
    Fig. 2. Finite element model of sapphire-GaN heterogeneous film system
    Temperature distribution of sapphire-GaN heterogeneous film system after cooling for 1 min
    Fig. 3. Temperature distribution of sapphire-GaN heterogeneous film system after cooling for 1 min
    Warpage deformation of sapphire-GaN heterogeneous film system after cooling for 1 min
    Fig. 4. Warpage deformation of sapphire-GaN heterogeneous film system after cooling for 1 min
    von Mises stress distribution of sapphire-GaN heterogeneous film system after cooling for 1 min
    Fig. 5. von Mises stress distribution of sapphire-GaN heterogeneous film system after cooling for 1 min
    Interfacial stress distribution of different thicknesses of GaN films for cooling to 1073 K. (a) 2 inch substrate; (b) 4 inch substrate
    Fig. 6. Interfacial stress distribution of different thicknesses of GaN films for cooling to 1073 K. (a) 2 inch substrate; (b) 4 inch substrate
    Variation of interfacial stress with the thickness of GaN film (ignore edges). (a) 2 inch substrate; (b) 4 inch substrate
    Fig. 7. Variation of interfacial stress with the thickness of GaN film (ignore edges). (a) 2 inch substrate; (b) 4 inch substrate
    Interfacial stress distribution of different sapphire substrate thickness for cooling to 1073 K. (a) 2 inch substrate; (b) 4 inch substrate
    Fig. 8. Interfacial stress distribution of different sapphire substrate thickness for cooling to 1073 K. (a) 2 inch substrate; (b) 4 inch substrate
    Variation of interfacial stress with ds/df. (a) 2 inch substrate; (b) 4 inch substrate
    Fig. 9. Variation of interfacial stress with ds/df. (a) 2 inch substrate; (b) 4 inch substrate
    Variation of the maximum warpage of film system with the thickness of GaN film. (a) 2 inch substrate; (b) 4 inch substrate
    Fig. 10. Variation of the maximum warpage of film system with the thickness of GaN film. (a) 2 inch substrate; (b) 4 inch substrate
    Change of stress caused by lattice mismatch and thermal mismatch with cooling time
    Fig. 11. Change of stress caused by lattice mismatch and thermal mismatch with cooling time
    MaterialDensity /(kg·m-3)Specific heat /(J·kg-1·K-1)Thermalconductivity /(W·m-1·K-1)Thermal expansioncoefficient /(10-6 K-1)Young'smodulus /GPaPossionratio
    Sapphire398076510.57.53720.25
    GaN61003551755.62100.17
    Table 1. Physical properties of materials[12]
    Zenglin Li, Ran Zuo. Simulation of Interfacial Stress in Sapphire-GaN Heterogeneous Film System[J]. Laser & Optoelectronics Progress, 2020, 57(19): 193102
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