Hao-Geng LI, Hong-Yu GU, Yu-Zhi ZHANG, Li-Xin SONG, Ling-Nan WU, Zhen-Yi QI, Tao ZHANG. Surface Protection of Polymer Materials from Atomic Oxygen: a Review [J]. Journal of Inorganic Materials, 2019, 34(7): 685
- Journal of Inorganic Materials
- Vol. 34, Issue 7, 685 (2019)
![Molecular structure of polyhedral oligomeric silsesquioxane (POSS) [24]](/richHtml/jim/2019/34/7/685/img_1.png)
1. Molecular structure of polyhedral oligomeric silsesquioxane (POSS) [24]
![PI surface modification to form polyamic acid: NaOH hydrolysis of PI (Step 1) to form sodium salt of polyamic acid followed by acidification (Step 2) to form polyamic acid[50]](/richHtml/jim/2019/34/7/685/img_2.png)
2. PI surface modification to form polyamic acid: NaOH hydrolysis of PI (Step 1) to form sodium salt of polyamic acid followed by acidification (Step 2) to form polyamic acid[50]
![SEM images of AO exposed (effective fluence ~2.0×1020atoms/cm2) samples: untreated samples[52,53] (a) masked section and (b) exposed section, images of ImplantoxTM treatment being (c) masked and (d) exposed sections, and AO exposed (e) Implantox-treated section and (f) untreated sections](/Images/icon/loading.gif){kind=icon}
3. SEM images of AO exposed (effective fluence ~2.0×1020atoms/cm2) samples: untreated samples[52,53] (a) masked section and (b) exposed section, images of ImplantoxTM treatment being (c) masked and (d) exposed sections, and AO exposed (e) Implantox-treated section and (f) untreated sections
4. SEM images of AO exposed (effective fluence~ 2.0×1020 atoms/cm2) sample surfaces morphology[56]: untreated original PI and (b) SiO2 coated PI
5. Initial (left, t =0) and final (right, t =35 ps) simulation snapshots of different PI protection system under AO impact[71]:PI-grafted (a) 15wt% POSS and (b) 30wt% POSS; 15wt% graphene (c) randomly oriented and (d) aligned
6. Potential barrier of an O atom permeating into interlayer of double-layer graphene with matched divacancy defect[74]
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Table 1. Erosion yield of atomic oxygen on PI samples[56]
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