[1] Pulker H K .Characterization of optical thin films[J]. Appl. Opt.1979, 18(12):1969—1977.
[2] DONG WS, LIN FQ, LIU CL, et al. Synthesis of ZrO2 nanowires by ionic-liquid route[J]. Journal of colloid and interface science, 2009, 333:734—740.
[3] Ritala M, Leskela M. Zirconium dioxide thin films deposited by ALE using zirconium tetrachloride as precursor[J]. Applied Surface Science, 1994, 75:333—340.
[4] Zhang DP, SHAO JA, Zhao YN, et al. Laser-induced damage threshold of ZrO2 thin films prepared at different oxygen partial pressures by electron-beam evaporation[J]. Journal of Vacuum Science & Technology A, 2005, 23:197—200.
[7] LIU A P, DUAN L H, HU J P, et al. Automatic detection of laser damage threshold by scattering light technique[C]. Proceedings of the 6th world congress on control and automation.2006:5318—5321.
[8] DUAN L H, LIU A P, CHEN S L, et al. Relation between microstructure and laser damage threshold of ZrO2 films[J]. International Journal of Modern Physics B.2005, 19:585—587.
[10] RICHARD A house II, JERRY R Bettis, ARTHUR H Guenther. Surface roughness and laser damage threshold[J]. IEEE Journal of quantumelectronics, 1977, 5:361—363.1001-9014(2010)05-0347-04