• Journal of Infrared and Millimeter Waves
  • Vol. 29, Issue 5, 333 (2010)
LIU An-Ping1, HAN Wei-Feng2, HUANG Mao2, and LUO Qing-Chun2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    LIU An-Ping, HAN Wei-Feng, HUANG Mao, LUO Qing-Chun. MICROSTRUCTURE AND RESISTING LASER DAMAGE PROPERTY OF ZrO2 FILMS[J]. Journal of Infrared and Millimeter Waves, 2010, 29(5): 333 Copy Citation Text show less
    References

    [1] Pulker H K .Characterization of optical thin films[J]. Appl. Opt.1979, 18(12):1969—1977.

    [2] DONG WS, LIN FQ, LIU CL, et al. Synthesis of ZrO2 nanowires by ionic-liquid route[J]. Journal of colloid and interface science, 2009, 333:734—740.

    [3] Ritala M, Leskela M. Zirconium dioxide thin films deposited by ALE using zirconium tetrachloride as precursor[J]. Applied Surface Science, 1994, 75:333—340.

    [4] Zhang DP, SHAO JA, Zhao YN, et al. Laser-induced damage threshold of ZrO2 thin films prepared at different oxygen partial pressures by electron-beam evaporation[J]. Journal of Vacuum Science & Technology A, 2005, 23:197—200.

    [7] LIU A P, DUAN L H, HU J P, et al. Automatic detection of laser damage threshold by scattering light technique[C]. Proceedings of the 6th world congress on control and automation.2006:5318—5321.

    [8] DUAN L H, LIU A P, CHEN S L, et al. Relation between microstructure and laser damage threshold of ZrO2 films[J]. International Journal of Modern Physics B.2005, 19:585—587.

    [10] RICHARD A house II, JERRY R Bettis, ARTHUR H Guenther. Surface roughness and laser damage threshold[J]. IEEE Journal of quantumelectronics, 1977, 5:361—363.1001-9014(2010)05-0347-04

    LIU An-Ping, HAN Wei-Feng, HUANG Mao, LUO Qing-Chun. MICROSTRUCTURE AND RESISTING LASER DAMAGE PROPERTY OF ZrO2 FILMS[J]. Journal of Infrared and Millimeter Waves, 2010, 29(5): 333
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