ZrO2 films were prepared at different conditions using electron beam evaporatim. The influences of oxygen pressure, temperature and substrate rotation on the films were analyzed. The relationship of microstructure characteristics and laser induced damage threshold was investigated. There are mostly monoclinic phases in ZrO2 with substrate rotation, and tetragonal phases without rotation. The surface roughness and grain size of ZrO2 films reduce with the increase of oxygen pressure, and the impact is greater for tetragonal phases than monoclinic phases. The increase of oxygen pressure makes the spathic structure change into the amorphism structure, and the damage threshold of spathic structure increases when the grain size reduces. The surface roughness of the film increases with the depositing temperature increasing. The damage threshold of spathic structure is much larger than the amorphism structure's. For ZrO2 films, the laser induced damage threshold and surface roughness (E-σ) approximately accord with Eσα=β(α=1.41, β=2.25).