• Opto-Electronic Engineering
  • Vol. 37, Issue 7, 102 (2010)
MA Ping*, ZHOU Shao-lin, HU Song, and XU Wen-xiang
Author Affiliations
  • [in Chinese]
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    DOI: Cite this Article
    MA Ping, ZHOU Shao-lin, HU Song, XU Wen-xiang. The Analysis of Moiré Fringes and Application on the Alignment of Lithography[J]. Opto-Electronic Engineering, 2010, 37(7): 102 Copy Citation Text show less

    Abstract

    Based on the actual application of Moiré fringes for the alignment of lithography, the modulating regulation on Moiré fringes produced by generic and line gratings is discussed according to Fourier optics in this paper,and the low frequency(1, -1) class Moiré fringe which is extensively applied was simulated. Aimed at two grating marks of the little difference from repeated frequency for the alignment of lithography, the magnified Moiré fringes would be produced with the characteristic sensitive to displacement,which was explained by simulation. Thus,high alignment accuracy of lithography was achieved. Finally, the alignment accuracy of lithography by the alignment method was analyzed briefly.
    MA Ping, ZHOU Shao-lin, HU Song, XU Wen-xiang. The Analysis of Moiré Fringes and Application on the Alignment of Lithography[J]. Opto-Electronic Engineering, 2010, 37(7): 102
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