Fractal surface of TiN thin films sputtered at different N2 flow ratios

Xiang-dong LUO

[1] Murarka S P. Multilevel interconnections for ULSI and GSI era [J].Mater. Sci. Eng.,1997,19: 87-15.

[2] Kagiyama A,Terakado K,Urao R. Effect of nitride and TiN coating temperatures on the corrosion resistance of the combined surface modification layer [J].Surf. Coat. Technol.,2003,169-170: 397-400.

[3] Wagner J,Mitter C,Penoy M. The Effect of Deposition Temperature on Microstructure and Properties of Thermal CVD TiN Coatings [J].Int. J. Refract Met Hard Mat,2008,26: 120-126.

[4] Peery A J,Manory R R,Ward L P. The Effect of Metal Ion Post-implantation on the Near Surface Properties of TiN Deposited by CVD [J].Surf. Coat. Technol.,2000,16933-134: 203-207.

[5] Takahashi T,Masugata K,et al. Surface Morphology of TiN Films Reactively Deposited by Bias Sputtering [J].Vacuum,2000,59:777-784.

[6] Ge S,Suo S. The Computation Methods for Fractal Dimension of Surface Profils [J].Trans Tribol,1997,17(4):354-362.

[8] Fromin A A,Akhmator V. Magnetron Sputtering System Stabilization for High Rate Deposition of AIN Films Vacuum [J].Vacuum,1998,49(3): 247-251.

[9] Aita C R,Gawlak C J. The Dependence of Alumium Nitride Films Crystallography on Sputtering Plasma Composition [J].J. Vac. Sci. Technol.,1983,Al(2): 402-406.

[11] Styervoyedov A,Farenik V. Formation of Ti and TiN Ultra-thin Films on Si by Ion Beam Sputter Deposition [J].Surf. Sci.,2006,600: 3766-3769.