• Acta Physica Sinica
  • Vol. 69, Issue 3, 030601-1 (2020)
Zheng-Qiong Dong1, Hang Zhao1, Jin-Long Zhu2, and Ya-Ting Shi2、*
Author Affiliations
  • 1Hubei Key Laboratory of Manufacture Quality Engineering, Hubei University of Technology, Wuhan 430068, China
  • 2State Key Laboratory for Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China
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    DOI: 10.7498/aps.69.20191525 Cite this Article
    Zheng-Qiong Dong, Hang Zhao, Jin-Long Zhu, Ya-Ting Shi. Influence of incident illumination on optical scattering measurement of typical photoresist nanostructure[J]. Acta Physica Sinica, 2020, 69(3): 030601-1 Copy Citation Text show less
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    Zheng-Qiong Dong, Hang Zhao, Jin-Long Zhu, Ya-Ting Shi. Influence of incident illumination on optical scattering measurement of typical photoresist nanostructure[J]. Acta Physica Sinica, 2020, 69(3): 030601-1
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