• Acta Optica Sinica
  • Vol. 37, Issue 3, 322003 (2017)
Dong Lijian*, Cui Qinglong, Li Pengzhi, and Zhao Lei
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/aos201737.0322003 Cite this Article Set citation alerts
    Dong Lijian, Cui Qinglong, Li Pengzhi, Zhao Lei. Design and Experiment of Active Compensation System for Thermal Aberration of Lithographic Lens[J]. Acta Optica Sinica, 2017, 37(3): 322003 Copy Citation Text show less
    References

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    [2] Zhao Feifei, Tang Jianyu, Huang Wei, et al. Computer-aided alignment for the lithographic lens[J]. Acta Optica Sinica, 2015, 34(6): 0622001.

    [3] Michael T, Ralf H, Erich M, et al. Optical imaging device, particularly an objective, with at least one optical element: US6191898B1[P]. 2001-02-20.

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    [5] Zhang Defu, Zhao Lei. Research of monolithic XY micro-adjustment mechanism based on compliance matrix[J]. Chinese Journal of Scientific Instrument, 2014, 35(2): 269-275.

    [6] Wolfgang H, Juergen F, Karl-eugen A, et al. Imaging device in a projection exposure facility: US7961294B2[P]. 2011-06-14.

    [7] Guo Kang, Gong Yan, Ni Mingyang. Design of a monolithic apparatus for the fine axial adjusting mechanism of optical element[J]. Acta Optica Sinica, 2012, 32(s1): s122002.

    [8] Toshiharu N, Yasuhiro O, Taro O, et al. Thermal aberration control in projection lens[C]. SPIE, 2008, 6924:69241V.

    [9] Ohmura Y, Ogata T, Hirayama T, et al. An aberration control of projection optics for multi-patterning lithography[C]. SPIE, 2011, 7973: 79730W.

    Dong Lijian, Cui Qinglong, Li Pengzhi, Zhao Lei. Design and Experiment of Active Compensation System for Thermal Aberration of Lithographic Lens[J]. Acta Optica Sinica, 2017, 37(3): 322003
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