[2] G DAI, L KOENDERS, J FLUEGGE et al. Two approaches for realizing traceability in nanoscale dimensional metrology. Optical Engineering, 55, 091407(2016).

[3] GAO S T. Research on metrological atomic fce microscopy investigate[D]. Tianjin: Tianjin University, 2007. (in Chinese)

[4] H BOSSE, B BODERMANN, G DAI et al. Challenges in nanometrology: high precision measurement of position and size. Technisches Messen, 82, 2(2015).

[5] KAWADA H, KE C M, CHENG Y C, et al. Methodologies f evaluating CDmatching of CDSEM[C]Proceedings of SPIE, 2009, 72720: 72720Y.

[6] BODERMANN B, HEIDENREICH S, PROBST J, et al. OCD metrology f advanced lithography[C]International Conference on Frontiers of acterization Metrology f Nanoelectronics, 2017.

[7] P BERNADO, E MYLONAS, M V PETOUKHOV et al. Structural characterization of flexible proteins using small-angle X-ray scattering.. Journal of the American Chemical Society, 129, 5656-5664(2007).

[8] N G ORJI, M BADAROGLU, B M BARNES et al. Publisher correction: Metrology for the next generation of semiconductor devices. Nature Electronics, 1, 662(2018).

[9] P J MOHR, D B NEWELL, B N TAYLOR et al. CODATA recommended values of the fundamental physical constants: 2014. Reviews of Modern Physics, 88, 035009(2016).

[10] M STOCK, R DAVIS, E De MIRANDÉS et al. The revision of the SI—the result of three decades of progress in metrology. Metrologia, 56, 022001(2019).

[11] J P FANTON. A brief history of metrology: Past, present, and future. International Journal of Metrology and Quality Engineering, 10, 8(2019).

[12] R J C BROWN. Evolution of the international system of units: considering the challenge of user adoption. Metrologia, 57, 023001(2020).

[13] Z WU, Y CAI, X WANG et al. Amorphous Si critical dimension structures with direct Si lattice calibration. Chinese Physics B, 28, 030601(2019).

[14] R G DIXSON, W F GUTHRIE, R A ALLEN et al. Process optimization for lattice-selective wet etching of crystalline silicon structures. Journal of Micro/Nanolithography Mems & Moems, 15, 014503(2016).

[15] J LIU, J ZHAO, X DENG et al. Hybrid application of laser-focused atomic deposition and extreme ultraviolet interference lithography methods for manufacturing of self-traceable nanogratings. Nanotechnology, 32, 175301(2021).

[16] R DIXSON, D A CHERNOFF, Shihua WANG et al. Multilaboratory comparison of traceable atomic force microscope measurements of a 70 nm grating pitch standard. Journal of Micro/Nanolithography, 10, 13015(2011).