• Infrared and Laser Engineering
  • Vol. 54, Issue 5, 20250074 (2025)
Yujie ZHANG1,2, Lihua LEI1,2, Yuqing GUAN1,2, Liqin LIU1,2..., Chuangwei GUO1,2, Zhangning XIE1,2, Ruishu XU1,2, Lijie LIANG1,2, Qiang LI3 and Gang LING1,2,*|Show fewer author(s)
Author Affiliations
  • 1Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China
  • 2Shanghai Key Laboratory of Online Test and Control Technology, Shanghai 201203, China
  • 3National Key Laboratory of Science and Technology on Metrology & Calibration, Changcheng Institute of Metrology & Measurement, AVIC, Beijing 100095, China
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    DOI: 10.3788/IRLA20250074 Cite this Article
    Yujie ZHANG, Lihua LEI, Yuqing GUAN, Liqin LIU, Chuangwei GUO, Zhangning XIE, Ruishu XU, Lijie LIANG, Qiang LI, Gang LING. Fusion metrology of nano-length traceability chain[J]. Infrared and Laser Engineering, 2025, 54(5): 20250074 Copy Citation Text show less
    Schematic diagram of chromium atomic lithography technique
    Fig. 1. Schematic diagram of chromium atomic lithography technique
    "Top-down" and "bottom-up" nano-length traceability chains
    Fig. 2. "Top-down" and "bottom-up" nano-length traceability chains
    The line width and grating are used to compare the contours and key parameters of the measured images when comparing the carriers, respectively
    Fig. 3. The line width and grating are used to compare the contours and key parameters of the measured images when comparing the carriers, respectively
    Linewidth calibration method based on silicon crystal plane spacing. (a) Direct traceability method; (b) Comparative traceability method
    Fig. 4. Linewidth calibration method based on silicon crystal plane spacing. (a) Direct traceability method; (b) Comparative traceability method
    Yujie ZHANG, Lihua LEI, Yuqing GUAN, Liqin LIU, Chuangwei GUO, Zhangning XIE, Ruishu XU, Lijie LIANG, Qiang LI, Gang LING. Fusion metrology of nano-length traceability chain[J]. Infrared and Laser Engineering, 2025, 54(5): 20250074
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