The Teclmology Control and Properties of PECVD SiON Filmsand Its Potential Applications

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 15 >Issue 7 >Page 913 > Article

Acta Optica Sinica
Vol. 15, Issue 7, 913 (1995)

The Teclmology Control and Properties of PECVD SiON Filmsand Its Potential Applications

[in Chinese]¹, [in Chinese]², [in Chinese]², [in Chinese]³, [in Chinese]³, [in Chinese]³, and [in Chinese]⁴

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¹[in Chinese]

²[in Chinese]

³[in Chinese]

⁴[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. The Teclmology Control and Properties of PECVD SiON Filmsand Its Potential Applications[J]. Acta Optica Sinica, 1995, 15(7): 913 Copy Citation Text

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References

CLP Journals

[1] Xiao Heping, Sun Rujian, Ma Xiangzhu, Yang Kai, Zhang Shuangxiang. Characteristics of Compactness of SiO2 Thin Films Prepared by PECVD Method[J]. Laser & Optoelectronics Progress, 2016, 53(12): 123101

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