The Teclmology Control and Properties of PECVD SiON Filmsand Its Potential Applications

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 15 >Issue 7 >Page 913 > Article

Acta Optica Sinica
Vol. 15, Issue 7, 913 (1995)

The Teclmology Control and Properties of PECVD SiON Filmsand Its Potential Applications

[in Chinese]¹, [in Chinese]², [in Chinese]², [in Chinese]³, [in Chinese]³, [in Chinese]³, and [in Chinese]⁴

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¹[in Chinese]

²[in Chinese]

³[in Chinese]

⁴[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. The Teclmology Control and Properties of PECVD SiON Filmsand Its Potential Applications[J]. Acta Optica Sinica, 1995, 15(7): 913 Copy Citation Text

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Abstract

The technology control, structure and properties of PECVD SiON films and thepotential applications of thih film waveguides in optical interconnections for VLSI arediscussed in this peper.

Keywords

optical interconnection plasma-enhanced chemicalvapor deposition optical waveguide

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