• Acta Optica Sinica
  • Vol. 16, Issue 10, 1493 (1996)
[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Emittance Measurement of a High Brightness Pseudospark Produced Electron Beam[J]. Acta Optica Sinica, 1996, 16(10): 1493 Copy Citation Text show less

    Abstract

    We report the emittance measurement of a electron beam produced in a pseudospark discharge device driven by a pulse line accelerator. A ten gap pseudospark device was operated at 200 kV, with anitrogen gas fill presure of 15 Pa. Small diameter (~1 mm) electron beam with current about 2 kA has been generated. The rms emittance of the beam is measured to be ε rms ≈ 48 mm·mrad about 5 cm downstream of the anode plane. The normalized emittance is then found to be ε n≈ 47 mm·mrad.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Emittance Measurement of a High Brightness Pseudospark Produced Electron Beam[J]. Acta Optica Sinica, 1996, 16(10): 1493
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