• Acta Optica Sinica
  • Vol. 41, Issue 1, 0114006 (2021)
Zhentang Zhao1、*, Dong Wang1, Lixin Yin1, Guoping Fang1, Qiang Gu1, Ming Gu1, Yongbin Leng1, Bo Liu1, Qiaogen Zhou1, Liren Shen1, Meng Zhang1, Haixiao Deng1, Jiahua Chen1, Jianhui Chen1, Zhihao Chen1, Jianguo Ding1, Wencheng Fang1, Chao Feng1, Duan Gu1, Xiao Hu1, Dazhang Huang1, Maomao Huang1, Zhiqiang Jiang1, Bin Li1, Guoqiang Lin1, Yiyong Liu1, Sen Sun1, Guanghong Wang1, Xingtao Wang1, Zhen Wang1, Yanqing Wu1, Luyang Yu1, Qibing Yuan1, Wei Zhang1, Shaopeng Zhong1, Xiaobin Xia2, Chuanxiang Tang3, Wenhui Huang3, Yingchao Du3, and Lixin Yan3
Author Affiliations
  • 1Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China
  • 2Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China
  • 3Department of Engineering Physics, Tsinghua University, Beijing 100084, China
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    DOI: 10.3788/AOS202141.0114006 Cite this Article Set citation alerts
    Zhentang Zhao, Dong Wang, Lixin Yin, Guoping Fang, Qiang Gu, Ming Gu, Yongbin Leng, Bo Liu, Qiaogen Zhou, Liren Shen, Meng Zhang, Haixiao Deng, Jiahua Chen, Jianhui Chen, Zhihao Chen, Jianguo Ding, Wencheng Fang, Chao Feng, Duan Gu, Xiao Hu, Dazhang Huang, Maomao Huang, Zhiqiang Jiang, Bin Li, Guoqiang Lin, Yiyong Liu, Sen Sun, Guanghong Wang, Xingtao Wang, Zhen Wang, Yanqing Wu, Luyang Yu, Qibing Yuan, Wei Zhang, Shaopeng Zhong, Xiaobin Xia, Chuanxiang Tang, Wenhui Huang, Yingchao Du, Lixin Yan. Shanghai Soft X-ray Free-Electron Laser Test Facility[J]. Acta Optica Sinica, 2021, 41(1): 0114006 Copy Citation Text show less
    SXFEL test facility in the SSRF campus
    Fig. 1. SXFEL test facility in the SSRF campus
    Schematic layout of SXFEL test facility
    Fig. 2. Schematic layout of SXFEL test facility
    Schematic of the undulator system for HGHG cascade
    Fig. 3. Schematic of the undulator system for HGHG cascade
    Gain curve and output spectra of 8.8 nm cascaded HGHG-FEL. (a) Gain curve; (b) output spectra
    Fig. 4. Gain curve and output spectra of 8.8 nm cascaded HGHG-FEL. (a) Gain curve; (b) output spectra
    Schematic of the undulator system for EEHG-HGHG cascade
    Fig. 5. Schematic of the undulator system for EEHG-HGHG cascade
    Gain curve and output spectra of the first stage EEHG. (a) Gain curve; (b) output spectra
    Fig. 6. Gain curve and output spectra of the first stage EEHG. (a) Gain curve; (b) output spectra
    Second stage gain curve of EEHG-HGHG cascade
    Fig. 7. Second stage gain curve of EEHG-HGHG cascade
    Schematic of the undulator system for single stage EEHG
    Fig. 8. Schematic of the undulator system for single stage EEHG
    Gain curve (20th harmonic) and radiation spot (30th harmonic) of single-stage EEHG. (a) Gain curve; (b) radiation spot
    Fig. 9. Gain curve (20th harmonic) and radiation spot (30th harmonic) of single-stage EEHG. (a) Gain curve; (b) radiation spot
    Injector of the SXFEL test facility
    Fig. 10. Injector of the SXFEL test facility
    Laser heater. (a) Sketch; (b) physical photograph
    Fig. 11. Laser heater. (a) Sketch; (b) physical photograph
    X-band linearizer
    Fig. 12. X-band linearizer
    Movable magnetic bunch compressor. (a) Sketch; (b) physical photograph
    Fig. 13. Movable magnetic bunch compressor. (a) Sketch; (b) physical photograph
    Longitudinal phase space and current distribution of electron beam at the linac exit. (a) Without X-band linearizer; (b) with X-band linearizer
    Fig. 14. Longitudinal phase space and current distribution of electron beam at the linac exit. (a) Without X-band linearizer; (b) with X-band linearizer
    C-band linac
    Fig. 15. C-band linac
    C-band deflecting cavity at the exit of the SXFEL linac and the measured longitudinal beam phase space distribution. (a) C-band deflecting cavity; (b) longitudinal beam phase space distribution
    Fig. 16. C-band deflecting cavity at the exit of the SXFEL linac and the measured longitudinal beam phase space distribution. (a) C-band deflecting cavity; (b) longitudinal beam phase space distribution
    U235 undulators installed in tunnel
    Fig. 17. U235 undulators installed in tunnel
    Cavity beam position monitor. (a) Photograph of the monitor; (b) resolution evaluation result
    Fig. 18. Cavity beam position monitor. (a) Photograph of the monitor; (b) resolution evaluation result
    X-band deflecting structures installed in the SXFEL test facility. (a) Photograph; (b) measured beam phase space when lasing
    Fig. 19. X-band deflecting structures installed in the SXFEL test facility. (a) Photograph; (b) measured beam phase space when lasing
    High resolution X-ray spectrometer in diagnostic beam line. (a) Photograph; (b) measured spectrum
    Fig. 20. High resolution X-ray spectrometer in diagnostic beam line. (a) Photograph; (b) measured spectrum
    Schematic of the SXFEL user facility
    Fig. 21. Schematic of the SXFEL user facility
    ComponentParameterDesign valueMeasurement value
    InjectorBunch charge /nC0.50.52
    Beam energy /MeV~120124.9
    Bunch length (FWHM) /ps8~109.44
    Normalized emittance /(mm·mrad)≤1.50.79(x)/0.96 (y)
    Energy spread (RMS) /%≤0.140.069
    Repetition rate /Hz1010
    Main linacBeam Energy /GeV0.840.842
    Energy spread (RMS) /%<0.150.094
    Normalized emittance /(mm·mrad)≤2.52.009(x)/1.434 (y)
    Bunch length (FWHM) /ps≤1.00.71
    Bunch charge /nC0.50.525
    Peak current /A≥500810
    Repetition rate /Hz1010
    Table 1. Main parameters of the SXFEL linac
    ParameterDesign valueMeasurement value
    Wavelength /nm<98.87
    Peak power /MW> 100207
    Pulse width /fs100--20069
    HGHG-HGHG cascading harmonics configuration6×56×5
    EEHG-HGHG cascading harmonics configuration6×56×5
    Table 2. Main FEL parameters of the SXFEL test facility
    Undulator modelU235U40U55U80
    Period /mm23.5405580
    Gap control precision /μm<3<3<3<3
    Peak field /T0.650.850.700.78
    First-order integral error /(Gs·cm)<50<50<50<50
    Second-order integral error /(Gs·cm2)<3000<3000<3000<3000
    Orbit straightness (RMS) /μm<5<10<10<10
    Phase error /(°)<5<5<5<5
    Length /m331.51.5
    Table 3. Undulator parameters in the SXFEL test facility
    ParameterDesign valueMeasurement value
    Central wavelength /nm266266
    Peak power /MW>100448
    Pulse width (FWHM) /fs~150161
    Table 4. Seed laser parameters in the SXFEL test facility
    ParameterMonitor typeSpecification
    Beam positionCavity BPM<1 μm@500 pC±500 μm DR
    Beam profileYAG/OTRResolution: 20 μmPositioning accuracy: 50 μm@0.5 nC
    Bunch chargeICT<1% @500 pC
    FEL pulse lengthDeflecting structureX-band, ~15 fs resolution
    FEL pulse profileFluorescence screenResolution: 20 μm
    FEL spectrumSpectrograph5--10 nm, resolution >5000
    Table 5. Beam and optical diagnostic systems and their main parameters at undulator section
    ParameterSeeded FEL line SASE line
    Beam energy /GeV1.5
    Energy spread (RMS) /%≤0.1
    Normalized emittance /(mm·mrad)≤1.5
    Peak current /A≥700
    FEL operation modeExternal seedingSASE
    Seed laser wavelength /nm240--360/
    FEL output wavelength /nm3--202--10
    FEL output peak power /MW≥100≥100
    FEL output pulse width (FWHM) /fs~50~100
    Table 6. Design parameters of the SXFEL user facility
    Zhentang Zhao, Dong Wang, Lixin Yin, Guoping Fang, Qiang Gu, Ming Gu, Yongbin Leng, Bo Liu, Qiaogen Zhou, Liren Shen, Meng Zhang, Haixiao Deng, Jiahua Chen, Jianhui Chen, Zhihao Chen, Jianguo Ding, Wencheng Fang, Chao Feng, Duan Gu, Xiao Hu, Dazhang Huang, Maomao Huang, Zhiqiang Jiang, Bin Li, Guoqiang Lin, Yiyong Liu, Sen Sun, Guanghong Wang, Xingtao Wang, Zhen Wang, Yanqing Wu, Luyang Yu, Qibing Yuan, Wei Zhang, Shaopeng Zhong, Xiaobin Xia, Chuanxiang Tang, Wenhui Huang, Yingchao Du, Lixin Yan. Shanghai Soft X-ray Free-Electron Laser Test Facility[J]. Acta Optica Sinica, 2021, 41(1): 0114006
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