• Laser & Optoelectronics Progress
  • Vol. 57, Issue 23, 232301 (2020)
Zhihao Yuan1、2, Yu Xu3, Bing Cao1、2、*, and Qinhua Wang1、2、*
Author Affiliations
  • 1School of Optoelectronic Science and Engineering, Soochow University, Suzhou, Jiangsu 215006, China
  • 2Key Lab of Modern Optical Technologies of Education Ministry of China, Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province, Suzhou, Jiangsu 215006, China
  • 3Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou, Jiangsu 215123, China
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    DOI: 10.3788/LOP57.232301 Cite this Article Set citation alerts
    Zhihao Yuan, Yu Xu, Bing Cao, Qinhua Wang. Broadband Transmission Infrared Light Modulator Based on Graphene Plasma[J]. Laser & Optoelectronics Progress, 2020, 57(23): 232301 Copy Citation Text show less
    Diagrams of Si-based double layer metal grating infrared light modulator based on graphene. (a) Three-dimensional diagram; (b) cross-section diagram
    Fig. 1. Diagrams of Si-based double layer metal grating infrared light modulator based on graphene. (a) Three-dimensional diagram; (b) cross-section diagram
    Transmission spectra of modulators without and with Al film on top. Transmission spectra of modulator without Al film on top for (a) TM incident light and (b) TE incident light under different Fermi levels; transmission spectra of modulator with Al film on top for (c) TM incident light and (d) TE incident light under different Fermi levels; (e) FWHM of resonant peak versus Fermi level with or without Al film
    Fig. 2. Transmission spectra of modulators without and with Al film on top. Transmission spectra of modulator without Al film on top for (a) TM incident light and (b) TE incident light under different Fermi levels; transmission spectra of modulator with Al film on top for (c) TM incident light and (d) TE incident light under different Fermi levels; (e) FWHM of resonant peak versus Fermi level with or without Al film
    Distributions of electric field of structures with and without Al film on top. (a) Electric field of structure without Al film on top when Fermi level Ef=0.3 eV and resonant wavelength λ=18.5 μm; (b) electric field of structure without Al film on top when Fermi level Ef=0.3 eV and λ=7 μm (away from the resonance peak); (c) electric field of structure with Al film on top when Fermi level Ef=0.3 eV and resonant wavelength λ
    Fig. 3. Distributions of electric field of structures with and without Al film on top. (a) Electric field of structure without Al film on top when Fermi level Ef=0.3 eV and resonant wavelength λ=18.5 μm; (b) electric field of structure without Al film on top when Fermi level Ef=0.3 eV and λ=7 μm (away from the resonance peak); (c) electric field of structure with Al film on top when Fermi level Ef=0.3 eV and resonant wavelength λ
    Influences of structural parameters on properties of proposed structure. (a) Transmissivity of TM light varying with H1 when W=110 nm, H2=50 nm, and P=150 nm; (b) transmissivity of TM light varying with W when H1=700nm, H2=50 nm, and P=150 nm; (c) transmissivity of TM light varying with H2 when H1=700nm, W=110 nm, and P=150 nm; (d) transmissivity o
    Fig. 4. Influences of structural parameters on properties of proposed structure. (a) Transmissivity of TM light varying with H1 when W=110 nm, H2=50 nm, and P=150 nm; (b) transmissivity of TM light varying with W when H1=700nm, H2=50 nm, and P=150 nm; (c) transmissivity of TM light varying with H2 when H1=700nm, W=110 nm, and P=150 nm; (d) transmissivity o
    Influence of H1on property of device. (a) H1=500 nm; (b) H1=600 nm; (c) H1=700 nm
    Fig. 5. Influence of H1on property of device. (a) H1=500 nm; (b) H1=600 nm; (c) H1=700 nm
    Zhihao Yuan, Yu Xu, Bing Cao, Qinhua Wang. Broadband Transmission Infrared Light Modulator Based on Graphene Plasma[J]. Laser & Optoelectronics Progress, 2020, 57(23): 232301
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