• Infrared and Laser Engineering
  • Vol. 49, Issue 3, 0305002 (2020)
Ming Guo1、2, Yongxiang Zhang3、*, Wenying Zhang1、2, and Hong Li1、2
Author Affiliations
  • 1Institute for Interdisciplinary Quantum Information Technology, Jilin Engineering Normal University, Changchun 130052, China
  • 2Jilin Engineering Laboratory for Quantum Information Technology, Changchun 130052, China
  • 3Business Branch, College of Optical and Electronical Information, Changchun University of Science and Technology, Changchun 130000, China
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    DOI: 10.3788/IRLA202049.0305002 Cite this Article
    Ming Guo, Yongxiang Zhang, Wenying Zhang, Hong Li. Thermal damage of monocrystalline silicon irradiated by long pulse laser[J]. Infrared and Laser Engineering, 2020, 49(3): 0305002 Copy Citation Text show less
    Experimental system for damage of monocrystalline silicon by long pulse laser
    Fig. 1. Experimental system for damage of monocrystalline silicon by long pulse laser
    Evolution of relationship between center temperature of monocrystalline silicon irradiated by lasers and time
    Fig. 2. Evolution of relationship between center temperature of monocrystalline silicon irradiated by lasers and time
    Relationship between the peak temperature of center point of monocrystalline silicon laser irradiation and the energy density and pulse width
    Fig. 3. Relationship between the peak temperature of center point of monocrystalline silicon laser irradiation and the energy density and pulse width
    Temperature variation and with energy density and pulse width
    Fig. 4. Temperature variation and with energy density and pulse width
    Cleavage damage structure of monocrystalline silicon
    Fig. 5. Cleavage damage structure of monocrystalline silicon
    Metallographic structure of multi-effect coupling damage in monocrystalline silicon
    Fig. 6. Metallographic structure of multi-effect coupling damage in monocrystalline silicon
    Peak corrosion damage structure of monocrystalline silicon
    Fig. 7. Peak corrosion damage structure of monocrystalline silicon
    Relationships between damage depth and laser energy density
    Fig. 8. Relationships between damage depth and laser energy density
    Relationship between the etching depth of monocrystalline silicon and number of pulse
    Fig. 9. Relationship between the etching depth of monocrystalline silicon and number of pulse
    Ming Guo, Yongxiang Zhang, Wenying Zhang, Hong Li. Thermal damage of monocrystalline silicon irradiated by long pulse laser[J]. Infrared and Laser Engineering, 2020, 49(3): 0305002
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