[1] K Mann, A Bayer, U Leinhos, et al.. Measurement of wavefront distortions in DUV optics due to lens heating [C]. SPIE, 2011, 7973: 79732B.
[2] J Zhou, Y Zhang, P Engblom, et al.. Improving aberration control with application specific optimization using computational lithography [C]. SPIE, 2010, 7640: 76400K.
[3] W Wang, F Tan, B Lü, et al.. Three-dimensional calculation of high-power, annularly distributed, laser-bam-induced thermal effects on reflectors and windows [J]. Appl Opt, 2005, 44(34): 7442-7450.
[4] Y Uehara, T Matsuyama, T Nakashima, et al.. Thermal aberration control for low k1 lithography [C]. SPIE, 2007, 6520: 65202V.
[5] T Nakashima, Y Ohmura, T Ogata, et al.. Thermal aberration control in projection lens [C]. SPIE, 2008, 6924: 69241V.
[6] Y Ohmura, T Ogata, T Hirayama, et al.. An aberration control of projection optics for multi-patterning lithography [C]. SPIE, 2011, 7973: 79730W.
[7] H Sewell, J McClay, A Guzman, et al.. Control for 70 nm optical lithography [C]. SPIE, 2001, 4404: 279-289.
[8] Chen Hua, Yang Huaijiang, Yu Xinfeng, et al.. Simulated and experimental study of laser-beam induced thermal aberrations in precision optical systems [J]. Appl Opt, 2013, 52(18): 4370-4376.
[9] Yang Shiming, Tao Wenquan. Heat Transfer [M]. Beijing: Higher Education Press, 1998. 25-28.