• Laser & Optoelectronics Progress
  • Vol. 50, Issue 11, 111403 (2013)
Li Shixiong1、*, Bai Zhongchen2, Chen Deliang1, and Qin Shuijie2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/lop50.111403 Cite this Article Set citation alerts
    Li Shixiong, Bai Zhongchen, Chen Deliang, Qin Shuijie. Research on the Fabrication of Micro Channels in Fused Silica Substrates by Laser-Induced Plasma[J]. Laser & Optoelectronics Progress, 2013, 50(11): 111403 Copy Citation Text show less

    Abstract

    A Q-switched Nd:YAG laser is used to fabricate micro channels in a fused silica substrate by laser-induced plasma processing. The interior wall of the micro channels drilled by laser-induced plasma is smooth, and the depth of the channel is up to 4 mm. High-power laser beam focused on the fused silica can lead to optical breakdown, resulting from the formation of plasma. The ablation of the high temperature plasma can lead to a micro channel. We study the ionization mechanism of optical breakdown in solids by nanosecond laser pulses. The changes of optical parameters, including dielectric function, reflectivity and refraction index, are studied. We also discuss the critical free electron density of optical breakdown and calculate the range of optical breakdown.
    Li Shixiong, Bai Zhongchen, Chen Deliang, Qin Shuijie. Research on the Fabrication of Micro Channels in Fused Silica Substrates by Laser-Induced Plasma[J]. Laser & Optoelectronics Progress, 2013, 50(11): 111403
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