[1] Chen Fulin, Zhang Jingxu, Wu Xiaoxia et al.. Supporting structure of 620 mm thin primary mirror and its active surface correction［J］. Optics & Precision Engineering, 2011, 19(5): 1022～1029
[2] Zeng Chunmei, Guo Peiji, Yu Jingchi. Deformation and analysis on correction of 0.5 m ultra-thin mirror with active support［J］. Optics & Precision Engineering, 2010, 18(3): 570～578
[3] Yan Yong, Jia Jiqiang, Jin Guang. Design of new type space-borne light-weighted primary mirror support ［J］ . Optics & Precision Engineering, 2008, 16(8): 1533～1539
[4] Dong Jjihong, Wang Kejun, Li Yanchun et al.. Lightweight design of large-aperture SiC primary mirrors for space remote sensors［J］ . Chinese Optics, 2011, 4(2): 118～123
[5] Wang Fuguo, Yang Hongbo, Yang Fei et al.. Optimization and analysis for the axis support points position of the large aperture mirrors ［J］. Infrared and Laser Engineering, 2007, 36(6): 877～880
[6] Wang Yang, Zhang Jingxu. Optimization and analysis for the support of the large aperture telescope primary mirror［J］. Opto-Electronic Engineering, 2009, 36(1): 107～113
[7] Yang Xianwei, Wu Qingwen, Li Shusheng et al.. Thermal design of space optical remote sensor［J］ . Chinese Optics, 2011, 4(2): 139～146
[8] Zhang Jian, Liu Weiqi, Wang Rudong et al.. Effect of gravity deformation on optical performance of super-accuracy Fizeau interferometer［J］. Acta Optica Sinica, 2011, 31(7): 0712001
[9] Wang Ping, Tian Wei, Wang Rudong et al.. Rotation chuck test for removing chuck error of optical surface［J］. Acta Optica Sinica, 2011, 31(8): 0812004
[10] Wang Rudong, Wang Ping, Tian Wei et al.. Design and analysis of compensation of large aperture optical element for gravity deformation［J］ . Chinese Optics, 2011, 4(3): 259～263
[11] Xu Rongwei, Liu Liren, Liu Hongzhan et al.. Support schemes and thermal deformation analysis of large-aperture interferometer mirror［J］. Acta Optica Sinica, 2003, 25(6): 809～815
[12] D. C. Watson, W. T. Novak. Kinematic Lens Mounting with Distributed Support and Radial Flexure ［P］. US Patent, 6239924, 2003-12-25
[13] Y. Sudoh. Correction Member, Retainer, Exposure Apparatus, and Device Fabrication Method ［P］. US Patent, 6909493, 2003-03-14
