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    Journals >Acta Optica Sinica >Volume 35 >Issue 6 >Page 622005 > Article
    • Acta Optica Sinica
    • Vol. 35, Issue 6, 622005 (2015)
    Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography
    Liu Xiaolei1、2、*, Li Sikun1、2, and Wang Xiangzhao1
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  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/aos201535.0622005 Cite this Article Set citation alerts
    Liu Xiaolei, Li Sikun, Wang Xiangzhao. Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography[J]. Acta Optica Sinica, 2015, 35(6): 622005 Copy Citation Text show less
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    Article index updated: May. 19, 2024
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    Liu Xiaolei, Li Sikun, Wang Xiangzhao. Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography[J]. Acta Optica Sinica, 2015, 35(6): 622005
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