• Acta Photonica Sinica
  • Vol. 51, Issue 4, 0404002 (2022)
Guoping LUO*, Xingyuan CHEN, Sumei HU, and Weiling ZHU
Author Affiliations
  • School of Science,Guangdong University of Petrochemical Technology,Maoming,Guangdong 525000,China
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    DOI: 10.3788/gzxb20225104.0404002 Cite this Article
    Guoping LUO, Xingyuan CHEN, Sumei HU, Weiling ZHU. Near Infrared Hot Electrons Photodetectors Based on Tamm Plasmons[J]. Acta Photonica Sinica, 2022, 51(4): 0404002 Copy Citation Text show less
    Schematic diagram and working mechanism of the broadband near infrared hot electrons photodetector with multi-layer structure
    Fig. 1. Schematic diagram and working mechanism of the broadband near infrared hot electrons photodetector with multi-layer structure
    Reflection and absorption spectra of various DBR structures and devices
    Fig. 2. Reflection and absorption spectra of various DBR structures and devices
    Energy distributed curves of the generation hot electrons with 1000 nm and 1800 nm incident light
    Fig. 3. Energy distributed curves of the generation hot electrons with 1000 nm and 1800 nm incident light
    Generation rate and transport probability distributed in the TiN thin films and corresponding device response spectra
    Fig. 4. Generation rate and transport probability distributed in the TiN thin films and corresponding device response spectra
    Absorption spectra of TiN thin films and device response spectra with various DBR period
    Fig. 5. Absorption spectra of TiN thin films and device response spectra with various DBR period
    Absorption spectra of TiN thin films and device responsivity with different DBR central wavelengths
    Fig. 6. Absorption spectra of TiN thin films and device responsivity with different DBR central wavelengths
    Absorption spectra of TiN thin films and device responsivity spectra with various TiN thicknesses
    Fig. 7. Absorption spectra of TiN thin films and device responsivity spectra with various TiN thicknesses
    Absorption spectra of TiN thin films and device responsivity spectra as a function of MgF anti-reflectance layer thickness(the thickness of TiN thin films is 10 nm)
    Fig. 8. Absorption spectra of TiN thin films and device responsivity spectra as a function of MgF anti-reflectance layer thickness(the thickness of TiN thin films is 10 nm)
    Absorption spectra of TiN thin films with different incident angles for the TE polarization and TM polarization
    Fig. 9. Absorption spectra of TiN thin films with different incident angles for the TE polarization and TM polarization
    Device responsivity as a function of incident angles with the TE polarization and TM polarization
    Fig. 10. Device responsivity as a function of incident angles with the TE polarization and TM polarization
    TypenHnLdH/nmdL/nm
    DBR-12.401.70135190
    DBR-22.401.45135225
    DBR-34.251.4575225
    Table 1. Refractive indices and corresponding thicknesses of the dielectric layers at 1300 nm with different DBR architectures
    Guoping LUO, Xingyuan CHEN, Sumei HU, Weiling ZHU. Near Infrared Hot Electrons Photodetectors Based on Tamm Plasmons[J]. Acta Photonica Sinica, 2022, 51(4): 0404002
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