Design and fabrication of a SiN-Si dual-layer optical phased array chip

Pengfei Wang; Guangzhen Luo; Yang Xu; Yajie Li; Yanmei Su; Jianbin Ma; Ruiting Wang; Zhengxia Yang; Xuliang Zhou; Yejin Zhang; Jiaoqing Pan

doi:10.1364/PRJ.387376

Journals >Photonics Research >Volume 8 >Issue 6 >Page 912 > Article

Photonics Research
Vol. 8, Issue 6, 912 (2020)

Design and fabrication of a SiN-Si dual-layer optical phased array chip

Pengfei Wang^1、2, Guangzhen Luo^1、2, Yang Xu³, Yajie Li^1、2, Yanmei Su^1、2, Jianbin Ma^1、2, Ruiting Wang^1、2, Zhengxia Yang^1、2, Xuliang Zhou^1、2, Yejin Zhang^1、2, and Jiaoqing Pan^1、2、*

Author Affiliations

¹Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³Beijing R&D Institute, VanJee Technology, Beijing 100193, China

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DOI: 10.1364/PRJ.387376 Cite this Article Set citation alerts

Pengfei Wang, Guangzhen Luo, Yang Xu, Yajie Li, Yanmei Su, Jianbin Ma, Ruiting Wang, Zhengxia Yang, Xuliang Zhou, Yejin Zhang, Jiaoqing Pan. Design and fabrication of a SiN-Si dual-layer optical phased array chip[J]. Photonics Research, 2020, 8(6): 912 Copy Citation Text

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Abstract

A SiN-Si dual-layer optical phased array (OPA) chip is designed and fabricated. It combines the low loss of SiN with the excellent modulation performance of Si, which improves the performance of Si single-layer OPA. A novel optical antenna and an improved phase modulation method are also proposed, and a two-dimensional scanning range of