Sputtering Power on the Microstructure and Properties of MgF2 Thin Films Prepared with Magnetron Sputtering

Changjiang ZHAO; Chao MA; Juncheng LIU; Zhigang LIU; Yan CHEN

doi:10.15541/jim200190565

Journals >Journal of Inorganic Materials >Volume 35 >Issue 9 >Page 1064 > Article

Journal of Inorganic Materials
Vol. 35, Issue 9, 1064 (2020)

Sputtering Power on the Microstructure and Properties of MgF₂ Thin Films Prepared with Magnetron Sputtering

Changjiang ZHAO^1、2、3, Chao MA^1、2, Juncheng LIU^1、2、*, Zhigang LIU³, and Yan CHEN³

Author Affiliations

¹School of Materials Science and Engineering, TIANGONG University, Tianjin 300387, China

²State Key Laboratory of Membrane Separation and Membrane Process, Tianjin 300387, China

³Beijing Institute of Spacecraft System Engineering, Beijing 100086, China

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DOI: 10.15541/jim200190565 Cite this Article

Changjiang ZHAO, Chao MA, Juncheng LIU, Zhigang LIU, Yan CHEN. Sputtering Power on the Microstructure and Properties of MgF₂ Thin Films Prepared with Magnetron Sputtering[J]. Journal of Inorganic Materials, 2020, 35(9): 1064 Copy Citation Text

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Effect of sputtering power on XPS spectrum of MgF2 film

1. Effect of sputtering power on XPS spectrum of MgF₂film

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Effect of sputtering power on XRD pattern of MgF2 thin film

2. Effect of sputtering power on XRD pattern of MgF₂ thin film

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3. Effect of sputtering power on the surface micro morphology of MgF₂ film

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$Effect of sputtering power on refractive index spectra of MgF2 thin film$

4. Effect of sputtering power on refractive index spectra of MgF₂ thin film

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5. Effect of sputtering power on transmission spectra of MgF₂ thin film

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$Relation between integrated transmittance within 300-1100 nm and refractive index of thin film at 550 nm$

6. Relation between integrated transmittance within 300-1100 nm and refractive index of thin film at 550 nm

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Sample	n(F) : n(Mg)	2θ/(°)	Intensity/(a.u.)	FWHM	Interplanar spacing/nm	Grain size/nm
115 W	1.65	57.832	127	0.95	0.1593	9.6
150 W	1.88	56.447	36086	0.534	0.1629	17.2
185 W	2.02	56.968	158	0.874	0.1615	10.4
220 W	2.44	Amorphous	-	-	-	-

Table 1.

Molar ratio of F to Mg and XRD analysis results of MgF₂ films

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Sputtering power/W	Thickness/nm	Refractive index within 300-1100 nm	Refractive index at 550 nm	Integral transmittancewithin 300-1100 nm/%
115	65	1.525-1.494	1.501	92.489
150	63	1.483-1.452	1.459	93.433
185	67	1.408-1.377	1.384	94.990
220	76	1.508-1.477	1.484	92.925
Glass	0		1.46	93.20

Table 2.

Thickness, refractive index and integral transmittance of MgF₂ film

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