A 16-channel InP based array waveguide grating (AWG) with 200 GHz channel spacing is designed and fabricated for monolithic photonic integrated circuits. Polarization independent deep ridge waveguide is applied to reduce chip size and improve the integration level. By using the technologies of metal organic chemical vapor deposition (MOCVD), lithography and induced coupler plasma etching (ICP), the chip is fabricated in our laboratory successfully. The test results show that the insertion loss is about -10 dB, crosstalk is less than -15 dB.