Xinhua Yang, Sikun Li, Lufeng Liao, Libin Zhang, Shuang Zhang, Shengrui Zhang, Weijie Shi, Yayi Wei, Xiangzhao Wang. Critical Pattern Selection Method for Full-Chip Source and Mask Optimization Based on Depth-First Search[J]. Acta Optica Sinica, 2022, 42(10): 1022002
- Acta Optica Sinica
- Vol. 42, Issue 10, 1022002 (2022)
Fig. 1. Schematic diagram of frequency extraction
Fig. 2. Schematic diagram of frequency grouping
Fig. 3. Flow chart of critical pattern selection
Fig. 4. Selection results of proposed method. (a) Group A; (b) group B
Fig. 5. Selection results of Tachyon Tflex method
Fig. 6. Optimized sources. (a) Group A of proposed method; (b) group B of proposed method; (c) Tachyon Tflex method
Fig. 7. Process windows obtained after mask optimization. (a) Common process windows; (b) EL varying with DOF (group A and Tachyon Tflex)
Fig. 8. Process windows obtained after mask optimization. (a) Common process windows; (b) EL varying with DOF (group B and Tachyon Tflex)
Fig. 9. Selection results of proposed method
Fig. 10. Selection results of Tachyon Tflex method
Fig. 11. Optimized source obtained by Tachyon Tflex method
Fig. 12. Light sources after mask optimization for critical pattern groups B1--B8 obtained by proposed method
Fig. 13. Comparison of public process windows and EL varying with DOF. (a) B1; (b) B2; (c) B3; (d) B4; (e) B5; (f) B6; (g) B7; (h) B8
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Table 1. Simulation settings
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Table 2. Comparison of key indicators under 10%CD deviation and 5%EL variation
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Table 3. Comparison of key indicators under 5%EL and 10%CD deviation (graph periodicity is not considered)
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