• Acta Photonica Sinica
  • Vol. 50, Issue 7, 230 (2021)
Yang YANG1, Gang LI1, Kewu JING1, Tianqi WANG1, Saiao PENG1, Tingting YAO1, and Shuyong CHEN2
Author Affiliations
  • 1State Key Laboratory of Advanced Technology for Float Glass, Institute of Coating-film Technology, Bengbu, Anhui233000, China
  • 2CNBM Bengbu Design & Research Institute for Glass Industry Co. Ltd, Bengbu, Anhui33018, China
  • show less
    DOI: 10.3788/gzxb20215007.0731002 Cite this Article
    Yang YANG, Gang LI, Kewu JING, Tianqi WANG, Saiao PENG, Tingting YAO, Shuyong CHEN. Studies on the Preparation and Properties of Nanocrystalline ZnSX Thin Films by RF Magnetron Sputtering Technique at Room Temperature[J]. Acta Photonica Sinica, 2021, 50(7): 230 Copy Citation Text show less
    XRD patterns of ZnSX thin films at various sputtering powers
    Fig. 1. XRD patterns of ZnSX thin films at various sputtering powers
    SEM images of ZnSXthin films at various sputtering powers
    Fig. 2. SEM images of ZnSXthin films at various sputtering powers
    Micro-Raman spectra of ZnSXthin films at various sputtering powers
    Fig. 3. Micro-Raman spectra of ZnSXthin films at various sputtering powers
    Transmittance of ZnSX thin films at various sputtering powers
    Fig. 4. Transmittance of ZnSX thin films at various sputtering powers
    (αhv)2-hv relationship curves of ZnSX thin films at various sputtering powers
    Fig. 5. αhv2-hv relationship curves of ZnSX thin films at various sputtering powers
    Fit results of Ψ of ZnSX film by Cauchy mode
    Fig. 6. Fit results of Ψ of ZnSX film by Cauchy mode
    Fit results of Δ of ZnSX film by Cauchy model
    Fig. 7. Fit results of Δ of ZnSX film by Cauchy model
    Refractive index of ZnSX thin films at various sputtering powers
    Fig. 8. Refractive index of ZnSX thin films at various sputtering powers
    Extinction coefficient of ZnSXthin films at various sputtering powers
    Fig. 9. Extinction coefficient of ZnSXthin films at various sputtering powers
    Sputtering power/WWd111/nma/nmD111/nmε/10-3β
    1000.3095.3620.980.4270.382
    1500.3065.3032.590.2860.252
    2000.3085.3220.990.4410.391
    Table 1. Crystal parameters at different sputtering powers
    Sputtering power/WW Zn/at.%S/ at.%Zn/S
    7560.1739.831.51
    10057.7142.291.36
    15055.3544.651.23
    20055.7444.261.26
    Table 2. EDX elemental analysis of ZnSX thin films at different sputtering powers
    Yang YANG, Gang LI, Kewu JING, Tianqi WANG, Saiao PENG, Tingting YAO, Shuyong CHEN. Studies on the Preparation and Properties of Nanocrystalline ZnSX Thin Films by RF Magnetron Sputtering Technique at Room Temperature[J]. Acta Photonica Sinica, 2021, 50(7): 230
    Download Citation