Study on the design and preparation technology of ultra-low profile wideband high reflection thin films

Jinlin Bai; Yugang Jiang; Lishuan Wang; Ziyang Li; Jiahuan He; Huasong Liu; Jianzhong Su

doi:10.3788/IRLA20200413

Journals >Infrared and Laser Engineering >Volume 50 >Issue 2 >Page 20200413 > Article

Infrared and Laser Engineering
Vol. 50, Issue 2, 20200413 (2021)

Study on the design and preparation technology of ultra-low profile wideband high reflection thin films

Jinlin Bai^1、2, Yugang Jiang^1、2, Lishuan Wang^1、2, Ziyang Li^1、2, Jiahuan He^1、2, Huasong Liu^1、2, and Jianzhong Su^1、2

Author Affiliations

¹Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Institute of Technical Physics, Tianjin 300308, China

²Joint Laboratory of Optoelectronic Materials and Intelligent Surface Structures, Tianjin 300308, China

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DOI: 10.3788/IRLA20200413 Cite this Article

Jinlin Bai, Yugang Jiang, Lishuan Wang, Ziyang Li, Jiahuan He, Huasong Liu, Jianzhong Su. Study on the design and preparation technology of ultra-low profile wideband high reflection thin films[J]. Infrared and Laser Engineering, 2021, 50(2): 20200413 Copy Citation Text

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References

[10] C Eda, B Bill, Z Oleg, et al. Mechanical and thermoelastic characteristics of optical thin films deposited by dual ion beam sputtering. Applied Optics, 48, 4536-4544(2009).

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