• Infrared and Laser Engineering
  • Vol. 50, Issue 2, 20200413 (2021)
Jinlin Bai1、2, Yugang Jiang1、2, Lishuan Wang1、2, Ziyang Li1、2, Jiahuan He1、2, Huasong Liu1、2, and Jianzhong Su1、2
Author Affiliations
  • 1Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Institute of Technical Physics, Tianjin 300308, China
  • 2Joint Laboratory of Optoelectronic Materials and Intelligent Surface Structures, Tianjin 300308, China
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    DOI: 10.3788/IRLA20200413 Cite this Article
    Jinlin Bai, Yugang Jiang, Lishuan Wang, Ziyang Li, Jiahuan He, Huasong Liu, Jianzhong Su. Study on the design and preparation technology of ultra-low profile wideband high reflection thin films[J]. Infrared and Laser Engineering, 2021, 50(2): 20200413 Copy Citation Text show less
    [in Chinese]
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    Fig. 10. [in Chinese]
    MaterialsModulus/GPaHardness/GPaPoisson’s ratio/GPa
    SiO2648.70.14
    Ta2O51169.60.29
    Fused silica699.70.17
    Table 1. [in Chinese]
    MaterialsResidual stress/GPaThermal stress/GPaIntrinsic stress/GPa
    SiO2−0.26−4.61E-04−0.262
    Ta2O5−0.226−0.83E-03−0.224
    Table 2. [in Chinese]
    Jinlin Bai, Yugang Jiang, Lishuan Wang, Ziyang Li, Jiahuan He, Huasong Liu, Jianzhong Su. Study on the design and preparation technology of ultra-low profile wideband high reflection thin films[J]. Infrared and Laser Engineering, 2021, 50(2): 20200413
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