• Acta Optica Sinica
  • Vol. 5, Issue 7, 619 (1985)
WANG ZHIGANG and DING LANTING
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  • [in Chinese]
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    WANG ZHIGANG, DING LANTING. Sensitivity factor of reflectance to the change of film thickness in ellipsometry[J]. Acta Optica Sinica, 1985, 5(7): 619 Copy Citation Text show less

    Abstract

    The formula for the sensitivity factor of reflectance of ambience-film-substrate systems to the change of film thickness is derived. Computer simulation is carried out for three different systems, and curves representing the dependence of the sensitivity factor on the angle of incidence are presented. A discussion for the choice of the angle of incidence in ellipsometry based upon results of computer simulation is given.
    WANG ZHIGANG, DING LANTING. Sensitivity factor of reflectance to the change of film thickness in ellipsometry[J]. Acta Optica Sinica, 1985, 5(7): 619
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