• Acta Physica Sinica
  • Vol. 69, Issue 2, 028501-1 (2020)
Kang Liu1 and Hua-Rui Sun1、2、*
Author Affiliations
  • 1School of Science, Harbin Institute of Technology (Shenzhen), Shenzhen 518055, China
  • 2Key Laboratory of Micro-Nano Optoelectronic Information System of Ministry of Industry and Information Technology, Harbin Institute of Technology (Shenzhen), Shenzhen 518055, China
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    DOI: 10.7498/aps.69.20190921 Cite this Article
    Kang Liu, Hua-Rui Sun. Raman thermometry based thermal resistance analysis of GaN high electron mobility transistors with copper-based composite flanges[J]. Acta Physica Sinica, 2020, 69(2): 028501-1 Copy Citation Text show less
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    Kang Liu, Hua-Rui Sun. Raman thermometry based thermal resistance analysis of GaN high electron mobility transistors with copper-based composite flanges[J]. Acta Physica Sinica, 2020, 69(2): 028501-1
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