Some integrated optics devices can be made based on the interdigital electrooptic bragg diffraction grating. The point-matching method is extended to the analysis of interdigital electrooptic bragg diffraction gratings. This method gives a simple and fast analytic expression of the electric fields in the structure. The field distributions are used to calculate the optical and electrical characteristic parameters of the gratings. The effects of finite conductor thickness have been taken into account in the analysis. It is shown that the simulation results agree well with the measured data.