• Acta Optica Sinica
  • Vol. 38, Issue 7, 0722001 (2018)
Weilin Cheng1、2, Fang Zhang1, Dongliang Lin1、2, Aijun Zeng1、2, Baoxi Yang1、2, and Huijie Huang1、2、*
Author Affiliations
  • 1 Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2 University of Chinese Academy of Sciences, Beijing 100049, China
  • show less
    DOI: 10.3788/AOS201838.0722001 Cite this Article Set citation alerts
    Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang. High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System[J]. Acta Optica Sinica, 2018, 38(7): 0722001 Copy Citation Text show less
    Schematics of illumination system including finger array uniformity corrector. (a) Schematic of photolithography illumination system; (b) schematic of integral uniformity corrector for illumination system
    Fig. 1. Schematics of illumination system including finger array uniformity corrector. (a) Schematic of photolithography illumination system; (b) schematic of integral uniformity corrector for illumination system
    Schematic of illumination field point at the focal plane of condenser lens group and its corresponding spread area at the adjustment plane (e.g. conventional illumination mode)
    Fig. 2. Schematic of illumination field point at the focal plane of condenser lens group and its corresponding spread area at the adjustment plane (e.g. conventional illumination mode)
    Schematic of relationship between fingers and pupil shape area in the correction plane
    Fig. 3. Schematic of relationship between fingers and pupil shape area in the correction plane
    Schematic of shape and layout of fingers in general finger array correction method
    Fig. 4. Schematic of shape and layout of fingers in general finger array correction method
    Schematics of adjustment process for general finger array correction methods. (a) Uncorrected illumination filed; (b) corrected by one pair of fingers; (c) corrected by two pairs of fingers
    Fig. 5. Schematics of adjustment process for general finger array correction methods. (a) Uncorrected illumination filed; (b) corrected by one pair of fingers; (c) corrected by two pairs of fingers
    Schematics of adjustment process for uniformity correction method with staggered fingers. (a) Uncorrected illumination filed; (b)-(g) single corrected process
    Fig. 6. Schematics of adjustment process for uniformity correction method with staggered fingers. (a) Uncorrected illumination filed; (b)-(g) single corrected process
    Schematics of structure of finger fore-end
    Fig. 7. Schematics of structure of finger fore-end
    Schematics of correction effect of different structures of finger fore-end. (a) Chamfer rectangle; (b) circle rectangle
    Fig. 8. Schematics of correction effect of different structures of finger fore-end. (a) Chamfer rectangle; (b) circle rectangle
    Schematic of adjustment for uniformity correction method with staggered and chamfered fingers
    Fig. 9. Schematic of adjustment for uniformity correction method with staggered and chamfered fingers
    Schematic of adjustment for uniformity correction method with staggered, chamfered and double layout fingers
    Fig. 10. Schematic of adjustment for uniformity correction method with staggered, chamfered and double layout fingers
    Simulation model of 65 nm node lithography illumination system
    Fig. 11. Simulation model of 65 nm node lithography illumination system
    Layoutstructure of staggered fingers
    Fig. 12. Layoutstructure of staggered fingers
    Layout structure of staggered and chamfered fingers
    Fig. 13. Layout structure of staggered and chamfered fingers
    Integral uniformity distributions adjusted by different fingers arrangements. (a) Conventional illumination mode with σ=0.15; (b) conventional illumination mode with σ=0.93; (c) annular illumination mode with σin=0.16 and σout=0.36; (d) annular illumination mode with σin=0.76 and σout=0.96
    Fig. 14. Integral uniformity distributions adjusted by different fingers arrangements. (a) Conventional illumination mode with σ=0.15; (b) conventional illumination mode with σ=0.93; (c) annular illumination mode with σin=0.16 and σout=0.36; (d) annular illumination mode with σin=0.76 and σout=0.96
    Layoutstructure of staggered, chamfered and double layout fingers
    Fig. 15. Layoutstructure of staggered, chamfered and double layout fingers
    Integral uniformity distributions adjusted by staggered, chamfered and double layout fingers arrangement. (a) Conventional illumination mode with σ=0.15; (b) conventional illumination mode with σ=0.93; (c) annular illumination mode with σin=0.16 and σout=0.36; (d) annular illumination mode with σin=0.76 and σout=0.96
    Fig. 16. Integral uniformity distributions adjusted by staggered, chamfered and double layout fingers arrangement. (a) Conventional illumination mode with σ=0.15; (b) conventional illumination mode with σ=0.93; (c) annular illumination mode with σin=0.16 and σout=0.36; (d) annular illumination mode with σin=0.76 and σout=0.96
    Illumination parameterCorrected illumination integrated uniformity /%
    GeneralfingersStaggeredfingersStaggered andchamfered fingersStaggered, chamfered anddouble layout fingers
    Conventionalillumination modeσ=0.15σ=0.930.320.310.180.190.300.290.150.16
    Annularillumination modeσin =0.16,σout =0.36σin =0.76,σout =0.960.300.290.180.170.310.320.150.16
    Table 1. Summary of results of corrected illumination integrated uniformity
    Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang. High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System[J]. Acta Optica Sinica, 2018, 38(7): 0722001
    Download Citation