• Acta Optica Sinica
  • Vol. 39, Issue 6, 0634001 (2019)
Geng Niu1、2, Junbiao Liu1、2、*, Weixia Zhao1, Li Han1、2, and Yutian Ma1、2
Author Affiliations
  • 1 Laboratory of Superconductors and New Materials, Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190, China
  • 2 University of Chinese Academy of Sciences, Beijing 100049, China
  • show less
    DOI: 10.3788/AOS201939.0634001 Cite this Article Set citation alerts
    Geng Niu, Junbiao Liu, Weixia Zhao, Li Han, Yutian Ma. Effect of Focused Bombarding Electron Beam on Transmission Microfocus X-Ray Source[J]. Acta Optica Sinica, 2019, 39(6): 0634001 Copy Citation Text show less
    Relative energy deposition as function of penetration depth of electron beam
    Fig. 1. Relative energy deposition as function of penetration depth of electron beam
    Energy deposition (left) and interaction (right) between electron beam with energy of 90 keV and tungsten target. Plot in left panel is energy deposition of black box in right panel
    Fig. 2. Energy deposition (left) and interaction (right) between electron beam with energy of 90 keV and tungsten target. Plot in left panel is energy deposition of black box in right panel
    Principle of X-ray imaging
    Fig. 3. Principle of X-ray imaging
    Intensity of X-ray produced by electron beam with different energies
    Fig. 4. Intensity of X-ray produced by electron beam with different energies
    Gaussian distribution of X-ray produced by 90 keV electron beam with energy loss of 20%-100%
    Fig. 5. Gaussian distribution of X-ray produced by 90 keV electron beam with energy loss of 20%-100%
    Distribution of X-ray produced by electron beam with different energies
    Fig. 6. Distribution of X-ray produced by electron beam with different energies
    Distribution of X-ray produced from different targets by 90 keV electron beam
    Fig. 7. Distribution of X-ray produced from different targets by 90 keV electron beam
    ParameterCondition
    Acceleration voltage of electron beam /kV30, 60, 90, 120, 150
    Spot diameter of electron beam /μm5
    Incident direction of electron beamPerpendicular to target
    Material of targetTungsten, molybdenum, chromium
    Thickness of targetCorresponding thickness which can deposit different energy percentages of electron beam (20%, 40%, 60%, 80% and 100%)
    Table 1. Simulation conditions of interaction between electron beam and target
    Geng Niu, Junbiao Liu, Weixia Zhao, Li Han, Yutian Ma. Effect of Focused Bombarding Electron Beam on Transmission Microfocus X-Ray Source[J]. Acta Optica Sinica, 2019, 39(6): 0634001
    Download Citation