[1] Yang Guopeng, Yu Xuchu, Feng Wufa et al.. The development and application of hyperspectral RS technology ［J］. Mapping Aviso, 2008, 10: 1～4
[2] Yang Yuezhong, Cao Wenxi, Sun Zhaohua et al.. Development of real-time hyperspectral radiation sea-observation system［J］. Acta Optica Sinica, 2009, 29(1): 102～107
[3] Lin Bing, Liu Dingquan, Kong Lingfang et al.. Fabrication of middle infrared 8-channel micro integrated filters［J］. Acta Optica Sinica, 2005, 34(9): 1316～1319
[4] Zhang Fengshan, Pan Jiandong, Zhang Shuying et al.. An 8~14 μm linear gradual changed filter［P］. Patent: ZL95244913.7, 1996. 12
[5] Hen Tao, Luo Chongtai, Liu Hongkai et al.. Development of multi-band linear variable filters［J］. Opto-Electronic Engineering, 2007, 34(7): 72～75
[6] Lin Xiaoyan, Wu Yonggang, Tian Guoxun et al.. Design of three-channel filters for the channel positions adjusted separately［J］. J. Nantong University (Natural Science Edition), 2008, 7(3): 23～26
[7] Lin Bing, Yu Tianyan, Li Daqi et al.. Study of fabrication of 16-channel micro integrated filter［J］. J. Infrared Millim. Waves, 2006, 25(4): 287～290
[8] Wang Shaowei, Wang Li, Wu Yonggang et al.. Arrays of narrow bandpass filters fabricated by combinatorial etching technique［J］. Acta Optica Sinica, 2006, 26(5): 746～751
[9] Wang Shaowei, Chen Xiaoshuang, Lu Wei. Fabrication of step filter for miniature wavelength-division device based on photolithography［J］. Acta Optica Sinica, 2009, 29(5): 1358～1362
[10] Duan Weibo, Liu Dingquan, Zhang Fengshan et al.. Study on optical properties of two thin film materials in medium-wave infrared band［J］. Acta Optica Sinica, 2009, 29(s1): 177～180
[11] Tang Jinfa, Gu Peifu, Liu Xu et al.. Modern Optical Thin Film Technology ［M］．Hangzhou: Zhejiang University Press, 2006. 20～160
[12] Zhao Lihua, Zhou Minghui, Wang Shuming et al.. Ion beam etching［J］. Semiconductor Technology, 1999, 24(1): 39～42
[13] Lin Bing, Liu Dingquan, Zhang Fengshan. The confirmation of etch rate of optical thin film with ion etch technology［J］. Optical Instruments, 2004, 26(2): 79～82
[14] Wang Xudi, Xu Xiangdong, Liu Ying et al.. Ion beam etching of HfO2 film［J］. Optics and Precision Engineering, 2004, 12(5): 454～458
