FABRICATION OF GaAs MICROLENSES ARRAY WITH LONG FOCAL LENGTH FOR IMPROVING RESPONSIVITY OF PtSi IRFPA DEVICE

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Journal of Infrared and Millimeter Waves >Volume 20 >Issue 5 >Page 321 > Article

Journal of Infrared and Millimeter Waves
Vol. 20, Issue 5, 321 (2001)

FABRICATION OF GaAs MICROLENSES ARRAY WITH LONG FOCAL LENGTH FOR IMPROVING RESPONSIVITY OF PtSi IRFPA DEVICE

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. FABRICATION OF GaAs MICROLENSES ARRAY WITH LONG FOCAL LENGTH FOR IMPROVING RESPONSIVITY OF PtSi IRFPA DEVICE[J]. Journal of Infrared and Millimeter Waves, 2001, 20(5): 321 Copy Citation Text

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References

[1] Popovic Z D, Sprague R A, Connell G A N. Technique for monolithic fabrication of microlens arrays. Appl. Opt., 1998, 27:1281-1284

[2] Haselbeck S, Schrelber H, Schwider J, et al. Microlenses fabricated by melting a photoresist on a baselayer. Opt. Eng., 1993, 32(6):1322-1327

[3] Jay T R, Stern M B. Preshaping photoresist for refractive microlens fabrication. Opt. Eng., 1994, 33(11):3553-3555

[4] Lars Erdmann, Dirk Efferenn. Technique for monolithic fabrication of silicon microlenses with selectable rim angles. Opt. Eng., 1997, 36(4):1094-1098

[5] ZHANG Xin-Yu, YI Xin-Jian, MIAO He, et al. Large-area quartz glass microlens array fabricated by ion beam etching for focal plane detectors. J.Infrared Millim.Waves, 1999, 18(2): 97-102.

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